The influence of a Si-doped layer in an AlGaAs/GaAs heterostructure on the damage introduced by CH4/H2/Ar ECR plasma etching

J.G. Hassel, van, C.M. Es, van, P.A.M. Nouwens, J.H. Maahury, J.S. Wellen

Research output: Chapter in Book/Report/Conference proceedingChapterAcademic

Original languageEnglish
Title of host publicationSemiconductor and Integrated Optoelectronics Conference, SIOE '95
Publication statusPublished - 1995
Event1995 Conference on Semiconductor and Integrated OptoElectronics (SIOE '95), March 1995, Cardiff, UK - Cardiff, United Kingdom
Duration: 1 Mar 1995 → …

Conference

Conference1995 Conference on Semiconductor and Integrated OptoElectronics (SIOE '95), March 1995, Cardiff, UK
Abbreviated titleSIOE '95
CountryUnited Kingdom
CityCardiff
Period1/03/95 → …

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