The growth of thin amorphous films from reactive gas phase species : in situ studies to unravel the growth mechanism

M.C.M. Sanden, van de; I.M.P. Aarts; A.C.R. Pipino; J.P.M. Hoefnagels; W.M.M. Kessels

The growth of thin amorphous films from reactive gas phase species : in situ studies to unravel the growth mechanism

M.C.M. Sanden, van de, I.M.P. Aarts, A.C.R. Pipino, J.P.M. Hoefnagels, W.M.M. Kessels

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

Original language	English
Title of host publication	ICRP-6/SPP-23 : proceedings of the 6th international conference on reactive plasmas and 23rd symposium on plasma processing : January 24-27, 2006, Matsushima/Sendai, Japan
Editors	R. Hatakeyama, S. Samukawa
Pages	113-114
Publication status	Published - 2006

Cite this

Sanden, van de, M. C. M., Aarts, I. M. P., Pipino, A. C. R., Hoefnagels, J. P. M., & Kessels, W. M. M. (2006). The growth of thin amorphous films from reactive gas phase species : in situ studies to unravel the growth mechanism. In R. Hatakeyama, & S. Samukawa (Eds.), ICRP-6/SPP-23 : proceedings of the 6th international conference on reactive plasmas and 23rd symposium on plasma processing : January 24-27, 2006, Matsushima/Sendai, Japan (pp. 113-114)

Sanden, van de, M.C.M. ; Aarts, I.M.P. ; Pipino, A.C.R. et al. / The growth of thin amorphous films from reactive gas phase species : in situ studies to unravel the growth mechanism. ICRP-6/SPP-23 : proceedings of the 6th international conference on reactive plasmas and 23rd symposium on plasma processing : January 24-27, 2006, Matsushima/Sendai, Japan. editor / R. Hatakeyama ; S. Samukawa. 2006. pp. 113-114

@inproceedings{f48169a3fe82495fb3c3d254b3d9bd57,

title = "The growth of thin amorphous films from reactive gas phase species : in situ studies to unravel the growth mechanism",

author = "\{Sanden, van de\}, M.C.M. and I.M.P. Aarts and A.C.R. Pipino and J.P.M. Hoefnagels and W.M.M. Kessels",

year = "2006",

language = "English",

pages = "113--114",

editor = "R. Hatakeyama and S. Samukawa",

booktitle = "ICRP-6/SPP-23 : proceedings of the 6th international conference on reactive plasmas and 23rd symposium on plasma processing : January 24-27, 2006, Matsushima/Sendai, Japan",

}

Sanden, van de, MCM, Aarts, IMP, Pipino, ACR, Hoefnagels, JPM & Kessels, WMM 2006, The growth of thin amorphous films from reactive gas phase species : in situ studies to unravel the growth mechanism. in R Hatakeyama & S Samukawa (eds), ICRP-6/SPP-23 : proceedings of the 6th international conference on reactive plasmas and 23rd symposium on plasma processing : January 24-27, 2006, Matsushima/Sendai, Japan. pp. 113-114.

The growth of thin amorphous films from reactive gas phase species : in situ studies to unravel the growth mechanism. / Sanden, van de, M.C.M.; Aarts, I.M.P.; Pipino, A.C.R. et al.
ICRP-6/SPP-23 : proceedings of the 6th international conference on reactive plasmas and 23rd symposium on plasma processing : January 24-27, 2006, Matsushima/Sendai, Japan. ed. / R. Hatakeyama; S. Samukawa. 2006. p. 113-114.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

TY - GEN

T1 - The growth of thin amorphous films from reactive gas phase species : in situ studies to unravel the growth mechanism

AU - Sanden, van de, M.C.M.

AU - Aarts, I.M.P.

AU - Pipino, A.C.R.

AU - Hoefnagels, J.P.M.

AU - Kessels, W.M.M.

PY - 2006

Y1 - 2006

M3 - Conference contribution

SP - 113

EP - 114

BT - ICRP-6/SPP-23 : proceedings of the 6th international conference on reactive plasmas and 23rd symposium on plasma processing : January 24-27, 2006, Matsushima/Sendai, Japan

A2 - Hatakeyama, R.

A2 - Samukawa, S.

ER -

Sanden, van de MCM, Aarts IMP, Pipino ACR, Hoefnagels JPM , Kessels WMM. The growth of thin amorphous films from reactive gas phase species : in situ studies to unravel the growth mechanism. In Hatakeyama R, Samukawa S, editors, ICRP-6/SPP-23 : proceedings of the 6th international conference on reactive plasmas and 23rd symposium on plasma processing : January 24-27, 2006, Matsushima/Sendai, Japan. 2006. p. 113-114