The expanding thermal plasma as an intense source of SiH3 for the fast deposition of a-Si:H

M.C.M. Sanden, van de, R.J. Severens, W.M.M. Kessels, J. Bastiaanssen, B.W.C. Hovens

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

Abstract

Abstract only.
Original languageEnglish
Title of host publicationAbstracts presented at MRS Spring '97 : 1997 spring meeting, March 31-April 4, San Francisco, California, USA
Pages31-
Publication statusPublished - 1997
EventAmorphous and Microcrystalline Silicon Technology 1997, March 31-April 4, 1997, San Francisco, CA, USA - San Francisco, CA, United States
Duration: 31 Mar 19974 Apr 1997

Conference

ConferenceAmorphous and Microcrystalline Silicon Technology 1997, March 31-April 4, 1997, San Francisco, CA, USA
CountryUnited States
CitySan Francisco, CA
Period31/03/974/04/97
OtherSymposium held at the 1997 MRS Spring Meeting

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