Abstract
The etch rate of InP in solutions of high HCl concentration was shown to be independent of the applied potential ina wide potential range negative with respect to the flatband value. Dissolution of the solid led to the formation of PH3.The etch rate, which was not mass-transport controlled, was first order in molecular HCl concentration. The results leadus to conclude that, in HCl etchants, InP is dissolved by a purely chemical mechanism. The influence of chemical etchingon the anodic behavior of InP in these electrolytes is described
| Original language | English |
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| Pages (from-to) | 2641-2644 |
| Number of pages | 4 |
| Journal | Journal of the Electrochemical Society |
| Volume | 131 |
| Issue number | 11 |
| DOIs | |
| Publication status | Published - 1984 |