Abstract
We report a systematic study of the In-assisted deoxidation (IAD) of epitaxial GaAs(100) substrates. Optimized IAD conditions resulting in a pit-free and smooth GaAs surface are found. Photoluminescence lines from single quantum dots (QDs) with linewidths in the range of 250–400 µeV are observed from low-density InAs QDs grown at a distance of 10 nm from a GaAs surface deoxidized under an optimized condition. Our study shows that IAD is very promising for application in the growth of nanostructures on patterned GaAs substrates.
| Original language | English |
|---|---|
| Article number | 092602 |
| Pages (from-to) | 1-6 |
| Journal | Applied Physics Letters |
| Volume | 106 |
| DOIs | |
| Publication status | Published - 2015 |
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