The chemical-mechanical relationship of the SiOC(H) dielectric film

C.A. Yuan, O. Sluis, van der, G.Q. Zhang, L.J. Ernst, W.D. Driel, van, R.B.R. Silfhout, van, B.J. Thijsse

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

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Engineering & Materials Science