The charge of micro-particles in a low pressure spatial plasma afterglow

Boy van Minderhout (Corresponding author), T. Peijnenburg, P. Blom, J.M. Vogels, Gerrit Kroesen, Job Beckers

Research output: Contribution to journalArticleAcademicpeer-review

1 Citation (Scopus)
7 Downloads (Pure)

Abstract

In this letter, we present charge measurements of micro-particles in the spatial afterglow (remote plasma) of an inductively coupled low pressure radiofrequency plasma. The particle afterglow charge of (-30 ± 7) e, being deducted from their acceleration in an externally applied electric field, is about three orders of magnitude lower compared to the typical charge expected in the bulk of such plasmas. This difference is explained by a relatively simplistic analytical model applying orbital motion limited theory in the afterglow region. From an application perspective, our results enable further understanding and development of in situ plasma-based particle contamination control for ultra-clean low pressure environments.

Original languageEnglish
Article number32LT03
Number of pages6
JournalJournal of Physics D: Applied Physics
Volume52
Issue number32
DOIs
Publication statusPublished - 10 Jun 2019

Fingerprint

afterglows
low pressure
Plasmas
Analytical models
contamination
Contamination
Electric fields
orbits
electric fields

Keywords

  • charge measurement
  • dusty plasma
  • plasma-assisted contamination control
  • spatial afterglow

Cite this

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The charge of micro-particles in a low pressure spatial plasma afterglow. / van Minderhout, Boy (Corresponding author); Peijnenburg, T.; Blom, P.; Vogels, J.M.; Kroesen, Gerrit; Beckers, Job.

In: Journal of Physics D: Applied Physics, Vol. 52, No. 32, 32LT03, 10.06.2019.

Research output: Contribution to journalArticleAcademicpeer-review

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AU - van Minderhout, Boy

AU - Peijnenburg, T.

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AU - Vogels, J.M.

AU - Kroesen, Gerrit

AU - Beckers, Job

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AB - In this letter, we present charge measurements of micro-particles in the spatial afterglow (remote plasma) of an inductively coupled low pressure radiofrequency plasma. The particle afterglow charge of (-30 ± 7) e, being deducted from their acceleration in an externally applied electric field, is about three orders of magnitude lower compared to the typical charge expected in the bulk of such plasmas. This difference is explained by a relatively simplistic analytical model applying orbital motion limited theory in the afterglow region. From an application perspective, our results enable further understanding and development of in situ plasma-based particle contamination control for ultra-clean low pressure environments.

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