The adhesion of SiNx thin layers on silica-acrylate coated polymer substrates

Amir Abdallah, K. Lu, C.D. Ovchinnikov, C.W.T. Bulle-Lieuwma, P.C.P. Bouten, G. With, de

Research output: Contribution to journalArticleAcademicpeer-review

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Abstract

Plasma Enhanced Chemical Vapor Deposition (PECVD) was used to grow 200, 300 and 400 nm thick silicon nitride layers (SiN x ) on a high temperature aromatic polyester substrate spin coated with a silica-acrylate hybrid coating (hard coat). Layers deposited without oxygen plasma treatment remained attached to the substrate, while spontaneous buckle delamination of the layer deposited with oxygen plasma treatment was observed directly after layer deposition. This effect was investigated using Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS), Atomic Force Microscopy (AFM) and Transmission Electron Microscopy (TEM). SIMS analyses showed a considerable increase of silicon oxide by exposing the substrate to oxygen plasma treatment, while AFM showed an increased roughness. Bright-field transmission electron micrographs show the presence of a particulate SiO2 layer. The oxygen plasma treatment thus removes the acrylate from the hard coat layer leaving behind the SiO2 particles leading to lower adhesion and thus to spontaneous buckle delamination. © 2009 Elsevier B.V. All rights reserved.
Original languageEnglish
Pages (from-to)78-84
JournalSurface and Coatings Technology
Volume204
Issue number1-2
DOIs
Publication statusPublished - 2009

Fingerprint

acrylates
Silicon Dioxide
Polymers
adhesion
Adhesion
Silica
oxygen plasma
Oxygen
silicon dioxide
Plasmas
polymers
Substrates
Secondary ion mass spectrometry
Delamination
Atomic force microscopy
Hard coatings
secondary ion mass spectrometry
Polyesters
Silicon oxides
Plasma enhanced chemical vapor deposition

Cite this

Abdallah, Amir ; Lu, K. ; Ovchinnikov, C.D. ; Bulle-Lieuwma, C.W.T. ; Bouten, P.C.P. ; With, de, G. / The adhesion of SiNx thin layers on silica-acrylate coated polymer substrates. In: Surface and Coatings Technology. 2009 ; Vol. 204, No. 1-2. pp. 78-84.
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abstract = "Plasma Enhanced Chemical Vapor Deposition (PECVD) was used to grow 200, 300 and 400 nm thick silicon nitride layers (SiN x ) on a high temperature aromatic polyester substrate spin coated with a silica-acrylate hybrid coating (hard coat). Layers deposited without oxygen plasma treatment remained attached to the substrate, while spontaneous buckle delamination of the layer deposited with oxygen plasma treatment was observed directly after layer deposition. This effect was investigated using Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS), Atomic Force Microscopy (AFM) and Transmission Electron Microscopy (TEM). SIMS analyses showed a considerable increase of silicon oxide by exposing the substrate to oxygen plasma treatment, while AFM showed an increased roughness. Bright-field transmission electron micrographs show the presence of a particulate SiO2 layer. The oxygen plasma treatment thus removes the acrylate from the hard coat layer leaving behind the SiO2 particles leading to lower adhesion and thus to spontaneous buckle delamination. {\circledC} 2009 Elsevier B.V. All rights reserved.",
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The adhesion of SiNx thin layers on silica-acrylate coated polymer substrates. / Abdallah, Amir; Lu, K.; Ovchinnikov, C.D.; Bulle-Lieuwma, C.W.T.; Bouten, P.C.P.; With, de, G.

In: Surface and Coatings Technology, Vol. 204, No. 1-2, 2009, p. 78-84.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - The adhesion of SiNx thin layers on silica-acrylate coated polymer substrates

AU - Abdallah, Amir

AU - Lu, K.

AU - Ovchinnikov, C.D.

AU - Bulle-Lieuwma, C.W.T.

AU - Bouten, P.C.P.

AU - With, de, G.

PY - 2009

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N2 - Plasma Enhanced Chemical Vapor Deposition (PECVD) was used to grow 200, 300 and 400 nm thick silicon nitride layers (SiN x ) on a high temperature aromatic polyester substrate spin coated with a silica-acrylate hybrid coating (hard coat). Layers deposited without oxygen plasma treatment remained attached to the substrate, while spontaneous buckle delamination of the layer deposited with oxygen plasma treatment was observed directly after layer deposition. This effect was investigated using Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS), Atomic Force Microscopy (AFM) and Transmission Electron Microscopy (TEM). SIMS analyses showed a considerable increase of silicon oxide by exposing the substrate to oxygen plasma treatment, while AFM showed an increased roughness. Bright-field transmission electron micrographs show the presence of a particulate SiO2 layer. The oxygen plasma treatment thus removes the acrylate from the hard coat layer leaving behind the SiO2 particles leading to lower adhesion and thus to spontaneous buckle delamination. © 2009 Elsevier B.V. All rights reserved.

AB - Plasma Enhanced Chemical Vapor Deposition (PECVD) was used to grow 200, 300 and 400 nm thick silicon nitride layers (SiN x ) on a high temperature aromatic polyester substrate spin coated with a silica-acrylate hybrid coating (hard coat). Layers deposited without oxygen plasma treatment remained attached to the substrate, while spontaneous buckle delamination of the layer deposited with oxygen plasma treatment was observed directly after layer deposition. This effect was investigated using Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS), Atomic Force Microscopy (AFM) and Transmission Electron Microscopy (TEM). SIMS analyses showed a considerable increase of silicon oxide by exposing the substrate to oxygen plasma treatment, while AFM showed an increased roughness. Bright-field transmission electron micrographs show the presence of a particulate SiO2 layer. The oxygen plasma treatment thus removes the acrylate from the hard coat layer leaving behind the SiO2 particles leading to lower adhesion and thus to spontaneous buckle delamination. © 2009 Elsevier B.V. All rights reserved.

U2 - 10.1016/j.surfcoat.2009.06.038

DO - 10.1016/j.surfcoat.2009.06.038

M3 - Article

VL - 204

SP - 78

EP - 84

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

SN - 0257-8972

IS - 1-2

ER -