The a-Si:H growth mechanism : temperature study of the SiH3 surface reactivity and the surface silicon hybride composition during film growth

W.M.M. Kessels; Y. Barrell; P.J. Oever, van den; J.P.M. Hoefnagels; M.C.M. Sanden, van de

The a-Si:H growth mechanism : temperature study of the SiH3 surface reactivity and the surface silicon hybride composition during film growth

W.M.M. Kessels
, Y. Barrell
, P.J. Oever, van den
, J.P.M. Hoefnagels
, M.C.M. Sanden, van de

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

Original language	English
Title of host publication	Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, USA / Ed. J.R. Abelson ... [et al.]
Place of Publication	Warrendale
Publisher	Materials Research Society
Pages	431-436
ISBN (Print)	1-558-99699-0
Publication status	Published - 2003

Publication series

Name	Materials Research Society symposium proceedings
Volume	762

Cite this

Kessels, W. M. M., Barrell, Y., Oever, van den, P. J., Hoefnagels, J. P. M., & Sanden, van de, M. C. M. (2003). The a-Si:H growth mechanism : temperature study of the SiH3 surface reactivity and the surface silicon hybride composition during film growth. In Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, USA / Ed. J.R. Abelson ... [et al.] (pp. 431-436). (Materials Research Society symposium proceedings; Vol. 762). Materials Research Society.

Kessels, W.M.M. ; Barrell, Y. ; Oever, van den, P.J. et al. / The a-Si:H growth mechanism : temperature study of the SiH3 surface reactivity and the surface silicon hybride composition during film growth. Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, USA / Ed. J.R. Abelson ... [et al.]. Warrendale : Materials Research Society, 2003. pp. 431-436 (Materials Research Society symposium proceedings).

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title = "The a-Si:H growth mechanism : temperature study of the SiH3 surface reactivity and the surface silicon hybride composition during film growth",

author = "W.M.M. Kessels and Y. Barrell and \{Oever, van den\}, P.J. and J.P.M. Hoefnagels and \{Sanden, van de\}, M.C.M.",

year = "2003",

language = "English",

isbn = "1-558-99699-0",

series = "Materials Research Society symposium proceedings",

publisher = "Materials Research Society",

pages = "431--436",

booktitle = "Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, USA / Ed. J.R. Abelson ... [et al.]",

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Kessels, WMM, Barrell, Y, Oever, van den, PJ, Hoefnagels, JPM & Sanden, van de, MCM 2003, The a-Si:H growth mechanism : temperature study of the SiH3 surface reactivity and the surface silicon hybride composition during film growth. in Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, USA / Ed. J.R. Abelson ... [et al.]. Materials Research Society symposium proceedings, vol. 762, Materials Research Society, Warrendale, pp. 431-436.

The a-Si:H growth mechanism : temperature study of the SiH3 surface reactivity and the surface silicon hybride composition during film growth. / Kessels, W.M.M.; Barrell, Y.; Oever, van den, P.J. et al.
Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, USA / Ed. J.R. Abelson ... [et al.]. Warrendale: Materials Research Society, 2003. p. 431-436 (Materials Research Society symposium proceedings; Vol. 762).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

TY - GEN

T1 - The a-Si:H growth mechanism : temperature study of the SiH3 surface reactivity and the surface silicon hybride composition during film growth

AU - Kessels, W.M.M.

AU - Barrell, Y.

AU - Oever, van den, P.J.

AU - Hoefnagels, J.P.M.

AU - Sanden, van de, M.C.M.

PY - 2003

Y1 - 2003

M3 - Conference contribution

SN - 1-558-99699-0

T3 - Materials Research Society symposium proceedings

SP - 431

EP - 436

BT - Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, USA / Ed. J.R. Abelson ... [et al.]

PB - Materials Research Society

CY - Warrendale

ER -

Kessels WMM, Barrell Y, Oever, van den PJ, Hoefnagels JPM , Sanden, van de MCM. The a-Si:H growth mechanism : temperature study of the SiH3 surface reactivity and the surface silicon hybride composition during film growth. In Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, USA / Ed. J.R. Abelson ... [et al.]. Warrendale: Materials Research Society. 2003. p. 431-436. (Materials Research Society symposium proceedings).