The a-Si:H growth mechanism : temperature study of the SiH3 surface reactivity and the surface silicon hybride composition during film growth

W.M.M. Kessels; Y. Barrell; P.J. Oever, van den; J.P.M. Hoefnagels; M.C.M. Sanden, van de

The a-Si:H growth mechanism : temperature study of the SiH3 surface reactivity and the surface silicon hybride composition during film growth

W.M.M. Kessels, Y. Barrell, P.J. Oever, van den, J.P.M. Hoefnagels, M.C.M. Sanden, van de

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

Original language	English
Title of host publication	Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, USA / Ed. J.R. Abelson ... [et al.]
Place of Publication	Warrendale
Publisher	Materials Research Society
Pages	431-436
ISBN (Print)	1-558-99699-0
Publication status	Published - 2003

Publication series

Name	Materials Research Society symposium proceedings
Volume	762

Cite this

Kessels, W. M. M., Barrell, Y., Oever, van den, P. J., Hoefnagels, J. P. M., & Sanden, van de, M. C. M. (2003). The a-Si:H growth mechanism : temperature study of the SiH3 surface reactivity and the surface silicon hybride composition during film growth. In Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, USA / Ed. J.R. Abelson ... [et al.] (pp. 431-436). (Materials Research Society symposium proceedings; Vol. 762). Materials Research Society.

Kessels, W.M.M. ; Barrell, Y. ; Oever, van den, P.J. et al. / The a-Si:H growth mechanism : temperature study of the SiH3 surface reactivity and the surface silicon hybride composition during film growth. Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, USA / Ed. J.R. Abelson ... [et al.]. Warrendale : Materials Research Society, 2003. pp. 431-436 (Materials Research Society symposium proceedings).

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title = "The a-Si:H growth mechanism : temperature study of the SiH3 surface reactivity and the surface silicon hybride composition during film growth",

author = "W.M.M. Kessels and Y. Barrell and {Oever, van den}, P.J. and J.P.M. Hoefnagels and {Sanden, van de}, M.C.M.",

year = "2003",

language = "English",

isbn = "1-558-99699-0",

series = "Materials Research Society symposium proceedings",

publisher = "Materials Research Society",

pages = "431--436",

booktitle = "Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, USA / Ed. J.R. Abelson ... [et al.]",

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Kessels, WMM, Barrell, Y, Oever, van den, PJ, Hoefnagels, JPM & Sanden, van de, MCM 2003, The a-Si:H growth mechanism : temperature study of the SiH3 surface reactivity and the surface silicon hybride composition during film growth. in Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, USA / Ed. J.R. Abelson ... [et al.]. Materials Research Society symposium proceedings, vol. 762, Materials Research Society, Warrendale, pp. 431-436.

The a-Si:H growth mechanism : temperature study of the SiH3 surface reactivity and the surface silicon hybride composition during film growth. / Kessels, W.M.M.; Barrell, Y.; Oever, van den, P.J. et al.
Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, USA / Ed. J.R. Abelson ... [et al.]. Warrendale: Materials Research Society, 2003. p. 431-436 (Materials Research Society symposium proceedings; Vol. 762).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

TY - GEN

T1 - The a-Si:H growth mechanism : temperature study of the SiH3 surface reactivity and the surface silicon hybride composition during film growth

AU - Kessels, W.M.M.

AU - Barrell, Y.

AU - Oever, van den, P.J.

AU - Hoefnagels, J.P.M.

AU - Sanden, van de, M.C.M.

PY - 2003

Y1 - 2003

M3 - Conference contribution

SN - 1-558-99699-0

T3 - Materials Research Society symposium proceedings

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EP - 436

BT - Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, USA / Ed. J.R. Abelson ... [et al.]

PB - Materials Research Society

CY - Warrendale

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Kessels WMM, Barrell Y, Oever, van den PJ, Hoefnagels JPM , Sanden, van de MCM. The a-Si:H growth mechanism : temperature study of the SiH3 surface reactivity and the surface silicon hybride composition during film growth. In Amorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, USA / Ed. J.R. Abelson ... [et al.]. Warrendale: Materials Research Society. 2003. p. 431-436. (Materials Research Society symposium proceedings).