The a-Si:H growth mechanism : temperature study of the SiH3 surface reactivity and the surface silicon hybride composition during film growth

W.M.M. Kessels, Y. Barrell, P.J. Oever, van den, J.P.M. Hoefnagels, M.C.M. Sanden, van de

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

Original languageEnglish
Title of host publicationAmorphous and nanocrystalline silicon-based films - 2003 : symposium held April 22-25, 2003, San Francisco, California, USA / Ed. J.R. Abelson ... [et al.]
Place of PublicationWarrendale
PublisherMaterials Research Society
ISBN (Print)1-558-99699-0
Publication statusPublished - 2003

Publication series

NameMaterials Research Society symposium proceedings

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