The 243 steps of making photonic integrated circuits in InP

B. Docter; J. Pozo; T. Vries, de; E.J. Geluk; J. Bolk; E. Smalbrugge; F. Karouta; Y.S. Oei; H.P.M.M. Ambrosius; M.K. Smit

The 243 steps of making photonic integrated circuits in InP

B. Docter, J. Pozo, T. Vries, de, E.J. Geluk, J. Bolk, E. Smalbrugge, F. Karouta, Y.S. Oei, H.P.M.M. Ambrosius, M.K. Smit

Photonic Integration

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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Abstract

The fabrication ofInP-based Photonic Integrated Circuits (PICs) is a complex process. The process used in the COBRA cleanroom in Eindhoven consists of 13 deposition, 10 lithography, 14 dry- and 7 wet-etching steps. Together with the intermediate cleaning, preparation and inspection procedures, the total process flow consists of 243 steps. In this paper we show how we created a robust modular process flow that can be usedfor a large variety of active- and passive circuits. These circuits can be fabricated together in multi-project wafer runs, allowing a drastic reduction of the fabrication costs making even small-volume production economicallyfeasible.

Original language	English
Title of host publication	Proceedings of the 15th Annual Symposium of the IEEE Photonics Benelux Chapter, 18-19 November 2010, Delft, The Netherlands
Editors	J. Pozo, M. Mortensen, P. Urbach, X. Leijtens, M. Yousefi
Place of Publication	Delft
Publisher	TNO
Pages	89-92
ISBN (Print)	978-90-78314-15-8
Publication status	Published - 2010

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Docter, B., Pozo, J., Vries, de, T., Geluk, E. J., Bolk, J., Smalbrugge, E., Karouta, F., Oei, Y. S., Ambrosius, H. P. M. M., & Smit, M. K. (2010). The 243 steps of making photonic integrated circuits in InP. In J. Pozo, M. Mortensen, P. Urbach, X. Leijtens, & M. Yousefi (Eds.), Proceedings of the 15th Annual Symposium of the IEEE Photonics Benelux Chapter, 18-19 November 2010, Delft, The Netherlands (pp. 89-92). TNO.

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title = "The 243 steps of making photonic integrated circuits in InP",

abstract = "The fabrication ofInP-based Photonic Integrated Circuits (PICs) is a complex process. The process used in the COBRA cleanroom in Eindhoven consists of 13 deposition, 10 lithography, 14 dry- and 7 wet-etching steps. Together with the intermediate cleaning, preparation and inspection procedures, the total process flow consists of 243 steps. In this paper we show how we created a robust modular process flow that can be usedfor a large variety of active- and passive circuits. These circuits can be fabricated together in multi-project wafer runs, allowing a drastic reduction of the fabrication costs making even small-volume production economicallyfeasible.",

author = "B. Docter and J. Pozo and {Vries, de}, T. and E.J. Geluk and J. Bolk and E. Smalbrugge and F. Karouta and Y.S. Oei and H.P.M.M. Ambrosius and M.K. Smit",

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editor = "J. Pozo and M. Mortensen and P. Urbach and X. Leijtens and M. Yousefi",

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Docter, B, Pozo, J, Vries, de, T, Geluk, EJ, Bolk, J, Smalbrugge, E, Karouta, F, Oei, YS, Ambrosius, HPMM & Smit, MK 2010, The 243 steps of making photonic integrated circuits in InP. in J Pozo, M Mortensen, P Urbach, X Leijtens & M Yousefi (eds), Proceedings of the 15th Annual Symposium of the IEEE Photonics Benelux Chapter, 18-19 November 2010, Delft, The Netherlands. TNO, Delft, pp. 89-92.

The 243 steps of making photonic integrated circuits in InP. / Docter, B.; Pozo, J.; Vries, de, T. et al.
Proceedings of the 15th Annual Symposium of the IEEE Photonics Benelux Chapter, 18-19 November 2010, Delft, The Netherlands. ed. / J. Pozo; M. Mortensen; P. Urbach; X. Leijtens; M. Yousefi. Delft: TNO, 2010. p. 89-92.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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T1 - The 243 steps of making photonic integrated circuits in InP

AU - Docter, B.

AU - Pozo, J.

AU - Vries, de, T.

AU - Geluk, E.J.

AU - Bolk, J.

AU - Smalbrugge, E.

AU - Karouta, F.

AU - Oei, Y.S.

AU - Ambrosius, H.P.M.M.

AU - Smit, M.K.

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N2 - The fabrication ofInP-based Photonic Integrated Circuits (PICs) is a complex process. The process used in the COBRA cleanroom in Eindhoven consists of 13 deposition, 10 lithography, 14 dry- and 7 wet-etching steps. Together with the intermediate cleaning, preparation and inspection procedures, the total process flow consists of 243 steps. In this paper we show how we created a robust modular process flow that can be usedfor a large variety of active- and passive circuits. These circuits can be fabricated together in multi-project wafer runs, allowing a drastic reduction of the fabrication costs making even small-volume production economicallyfeasible.

AB - The fabrication ofInP-based Photonic Integrated Circuits (PICs) is a complex process. The process used in the COBRA cleanroom in Eindhoven consists of 13 deposition, 10 lithography, 14 dry- and 7 wet-etching steps. Together with the intermediate cleaning, preparation and inspection procedures, the total process flow consists of 243 steps. In this paper we show how we created a robust modular process flow that can be usedfor a large variety of active- and passive circuits. These circuits can be fabricated together in multi-project wafer runs, allowing a drastic reduction of the fabrication costs making even small-volume production economicallyfeasible.

M3 - Conference contribution

SN - 978-90-78314-15-8

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EP - 92

BT - Proceedings of the 15th Annual Symposium of the IEEE Photonics Benelux Chapter, 18-19 November 2010, Delft, The Netherlands

A2 - Pozo, J.

A2 - Mortensen, M.

A2 - Urbach, P.

A2 - Leijtens, X.

A2 - Yousefi, M.

PB - TNO

CY - Delft

ER -

The 243 steps of making photonic integrated circuits in InP

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