Temperature dependence and silane consumption during particle formation in Ar-silane RF capacitively coupled plasma

M. Sorokin, G.M.W. Kroesen, W.W. Stoffels

Research output: Contribution to journalArticleAcademicpeer-review

9 Citations (Scopus)

Abstract

We propose a generalized model, based on a simple balance equation, explaining the temperature dependence of the agglomeration time of nanoclusters in Ar-SiH4 plasmas. This model allows easy incorporation of specific mechanisms and verification of their effect on particle growth. We consider extra Silane consumption due to back diffusion, an important issue for the laboratory plasma experiments and modeling results interpretation.
Original languageEnglish
Pages (from-to)731-737
JournalIEEE Transactions on Plasma Science
Volume32
Issue number2
DOIs
Publication statusPublished - 2004

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