Synthesis and characterization of mesoporous silica thin films as a catalyst support on a titanium substrate

T.S. Glazneva, E.V. Rebrov, J.C. Schouten, E.A. Paukshtis, Z.R. Ismagilov

Research output: Contribution to journalArticleAcademicpeer-review

25 Citations (Scopus)

Abstract

Mesoporous silica films with a thickness of 500–900 nm were synthesized on a titanium substrate by the evaporation-induced self-assembly method (with 900–1200 rpm for 90 s) using cetyltrimethylammonium bromide (CTAB) as structure-directing agent and tetraethyl orthosilicate as the silica source. Prior to coating deposition, the titanium substrate was oxidized to increase the surface roughness up to 500 nm and to produce a thin titania layer. Just before the synthesis, the titania layer was made super hydrophilic by an UV treatment for 2 h to provide a better adhesion of the silica film to the substrate. Films with hexagonal and cubic mesostructures with a uniform pore size of 2.8 nm and a surface area of 1080 m2/g were obtained and characterized by different methods. An alternative approach for surfactant removal by gradual heating up to 250 °C in vacuum was applied. Complete removal of CTAB from the as-synthesized silica films was confirmed by infrared spectroscopy.
Original languageEnglish
Pages (from-to)6391-6394
JournalThin Solid Films
Volume515
Issue number16
DOIs
Publication statusPublished - 2007

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