Abstract
The synergy between fast (1600 nm · min−1), roll-to-roll plasma-enhanced chemical vapor deposited (PE-CVD) SiO2 layers and plasma-assisted atomic layer deposited (PA-ALD) ultra-thin Al2O3 films has been investigated in terms of moisture permeation barrier properties. The effective and intrinsic water vapor transmission rates (WVTR) were studied as a function of the number of ALD cycles. It was demonstrated that a synergistic combination of a silica buffer layer deposited on polymer with an ultra-thin (≤ 2 nm) alumina barrier film can provide excellent intrinsic (10−5–10−6 g · m−2 · day−1) and good effective (∼10−3 g · m−2 · day−1) WVTR values, whereas both single layers individually exhibit poor barrier performances with effective WVTR values of ≥ 1.0 g · m−2 · day−1
Original language | English |
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Pages (from-to) | 311-315 |
Journal | Plasma Processes and Polymers |
Volume | 13 |
Issue number | 3 |
DOIs | |
Publication status | Published - 2016 |