Synergy between plasma-assisted ALD and roll-to-roll atmospheric pressure PE-CVD processing of moisture barrier films on polymers

S.A. Starostin, W. Keuning, J.R.G. Schalken, M. Creatore, W.M.M. Kessels, J.B. Bouwstra, M.C.M. Sanden, van de, H.W. Vries, de

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Abstract

The synergy between fast (1600 nm · min−1), roll-to-roll plasma-enhanced chemical vapor deposited (PE-CVD) SiO2 layers and plasma-assisted atomic layer deposited (PA-ALD) ultra-thin Al2O3 films has been investigated in terms of moisture permeation barrier properties. The effective and intrinsic water vapor transmission rates (WVTR) were studied as a function of the number of ALD cycles. It was demonstrated that a synergistic combination of a silica buffer layer deposited on polymer with an ultra-thin (≤ 2 nm) alumina barrier film can provide excellent intrinsic (10−5–10−6 g · m−2 · day−1) and good effective (∼10−3 g · m−2 · day−1) WVTR values, whereas both single layers individually exhibit poor barrier performances with effective WVTR values of ≥ 1.0 g · m−2 · day−1
Original languageEnglish
Pages (from-to)311-315
JournalPlasma Processes and Polymers
Volume13
Issue number3
DOIs
Publication statusPublished - 2016

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Steam
moisture
Water vapor
Atmospheric pressure
atmospheric pressure
Polymers
Moisture
Vapors
vapors
Plasmas
water vapor
polymers
Processing
Aluminum Oxide
Ultrathin films
Buffer layers
Permeation
Silicon Dioxide
Alumina
Silica

Cite this

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title = "Synergy between plasma-assisted ALD and roll-to-roll atmospheric pressure PE-CVD processing of moisture barrier films on polymers",
abstract = "The synergy between fast (1600 nm · min−1), roll-to-roll plasma-enhanced chemical vapor deposited (PE-CVD) SiO2 layers and plasma-assisted atomic layer deposited (PA-ALD) ultra-thin Al2O3 films has been investigated in terms of moisture permeation barrier properties. The effective and intrinsic water vapor transmission rates (WVTR) were studied as a function of the number of ALD cycles. It was demonstrated that a synergistic combination of a silica buffer layer deposited on polymer with an ultra-thin (≤ 2 nm) alumina barrier film can provide excellent intrinsic (10−5–10−6 g · m−2 · day−1) and good effective (∼10−3 g · m−2 · day−1) WVTR values, whereas both single layers individually exhibit poor barrier performances with effective WVTR values of ≥ 1.0 g · m−2 · day−1",
author = "S.A. Starostin and W. Keuning and J.R.G. Schalken and M. Creatore and W.M.M. Kessels and J.B. Bouwstra and {Sanden, van de}, M.C.M. and {Vries, de}, H.W.",
year = "2016",
doi = "10.1002/ppap.201500096",
language = "English",
volume = "13",
pages = "311--315",
journal = "Plasma Processes and Polymers",
issn = "1612-8850",
publisher = "Wiley-VCH Verlag",
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}

Synergy between plasma-assisted ALD and roll-to-roll atmospheric pressure PE-CVD processing of moisture barrier films on polymers. / Starostin, S.A.; Keuning, W.; Schalken, J.R.G.; Creatore, M.; Kessels, W.M.M.; Bouwstra, J.B.; Sanden, van de, M.C.M.; Vries, de, H.W.

In: Plasma Processes and Polymers, Vol. 13, No. 3, 2016, p. 311-315.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Synergy between plasma-assisted ALD and roll-to-roll atmospheric pressure PE-CVD processing of moisture barrier films on polymers

AU - Starostin, S.A.

AU - Keuning, W.

AU - Schalken, J.R.G.

AU - Creatore, M.

AU - Kessels, W.M.M.

AU - Bouwstra, J.B.

AU - Sanden, van de, M.C.M.

AU - Vries, de, H.W.

PY - 2016

Y1 - 2016

N2 - The synergy between fast (1600 nm · min−1), roll-to-roll plasma-enhanced chemical vapor deposited (PE-CVD) SiO2 layers and plasma-assisted atomic layer deposited (PA-ALD) ultra-thin Al2O3 films has been investigated in terms of moisture permeation barrier properties. The effective and intrinsic water vapor transmission rates (WVTR) were studied as a function of the number of ALD cycles. It was demonstrated that a synergistic combination of a silica buffer layer deposited on polymer with an ultra-thin (≤ 2 nm) alumina barrier film can provide excellent intrinsic (10−5–10−6 g · m−2 · day−1) and good effective (∼10−3 g · m−2 · day−1) WVTR values, whereas both single layers individually exhibit poor barrier performances with effective WVTR values of ≥ 1.0 g · m−2 · day−1

AB - The synergy between fast (1600 nm · min−1), roll-to-roll plasma-enhanced chemical vapor deposited (PE-CVD) SiO2 layers and plasma-assisted atomic layer deposited (PA-ALD) ultra-thin Al2O3 films has been investigated in terms of moisture permeation barrier properties. The effective and intrinsic water vapor transmission rates (WVTR) were studied as a function of the number of ALD cycles. It was demonstrated that a synergistic combination of a silica buffer layer deposited on polymer with an ultra-thin (≤ 2 nm) alumina barrier film can provide excellent intrinsic (10−5–10−6 g · m−2 · day−1) and good effective (∼10−3 g · m−2 · day−1) WVTR values, whereas both single layers individually exhibit poor barrier performances with effective WVTR values of ≥ 1.0 g · m−2 · day−1

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DO - 10.1002/ppap.201500096

M3 - Article

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EP - 315

JO - Plasma Processes and Polymers

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SN - 1612-8850

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