Synergistic etch rates during low-energetic plasma etching for hydrogenated amorphous carbon

T.A.R. Hansen, J.W. Weber, P.G.J. Colsters, D.M.H.G. Mestrom, M.C.M. Sanden, van de, R.A.H. Engeln

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Abstract

The etch mechanisms of hydrogenated amorphous carbon thin films in low-energetic (
Original languageEnglish
Article number013302
Pages (from-to)013302-1/12
Number of pages12
JournalJournal of Applied Physics
Volume112
Issue number1
DOIs
Publication statusPublished - 2012

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