@article{0ebde83613784dfeb35475fb4d1e6e31,
title = "Synergistic etch rates during low-energetic plasma etching for hydrogenated amorphous carbon",
abstract = "The etch mechanisms of hydrogenated amorphous carbon thin films in low-energetic (",
author = "T.A.R. Hansen and J.W. Weber and P.G.J. Colsters and D.M.H.G. Mestrom and {Sanden, van de}, M.C.M. and R.A.H. Engeln",
year = "2012",
doi = "10.1063/1.4730924",
language = "English",
volume = "112",
pages = "013302--1/12",
journal = "Journal of Applied Physics",
issn = "0021-8979",
publisher = "American Institute of Physics",
number = "1",
}