@article{611d9099fcf845acabec5aa19c2061c4,
title = "Synchronizing decentralized control loops for overall performance enhancement : a Youla framework applied to a wafer scanner",
abstract = "Manufacturing equipment often consists of multiple subsystems. For instance, in lithographic IC manufacturing, both a reticle stage and a wafer stage move synchronously. Traditionally, these subsystems are divided into manageable subproblems, at the expense of a suboptimal overall solution. The aim of this paper is to develop a framework for overall system performance improvement. The method pursued in this paper builds on traditional designs, and extends these through a bi-directional controller coupling. The aim here is to optimize a criterion that speci{\'e}s overall system performance. To achieve this, a new parameterization that relates to the Youla parameterization is developed that connects the bi-directional controller parameter affinely to the overall control criterion, which enables a systematic design. The performance improvement is confirmed in a case study using measured data from an industrial wafer scanner.",
keywords = "Coupling, Decentralized control, Mechatronic systems, Motion Control Systems",
author = "E. Evers and {van de Wal}, M.M.J. and T.A.E. Oomen",
year = "2017",
month = oct,
day = "18",
doi = "10.1016/j.ifacol.2017.08.2382",
language = "English",
volume = "50",
pages = "10845--10850",
journal = "IFAC-PapersOnLine",
publisher = "Elsevier",
number = "1",
note = "20th World Congress of the International Federation of Automatic Control (IFAC 2017 World Congress), IFAC 2017 ; Conference date: 09-07-2017 Through 14-07-2017",
url = "https://www.ifac2017.org/",
}