Surface textured ZnO films for thin film solar cell applications by expanding thermal plasma CVD

R. Groenen, J. Löffler, P.M. Sommeling, J.L. Linden, E.A.G. Hamers, R.E.I. Schropp, M.C.M. Sanden, van de

Research output: Contribution to journalArticleAcademicpeer-review

97 Citations (Scopus)
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Abstract

An expanding thermal plasma created by a cascaded arc is used to deposit surface textured ZnO films. Films have been deposited at 150–350°C at a rate of typically 0.70 nm/s. They exhibit low resistivity (80%) and a rough surface texture. The crystallite size and surface roughness increase with increasing deposition temperature and flow of argon ions. At the same time columnar textured growth gets less pronounced, a change to granular growth is observed. First p-i-n a-Si:H solar cells deposited on this material with initial efficiencies approaching 10% have been realised.
Original languageEnglish
Pages (from-to)226-230
JournalThin Solid Films
Volume392
Issue number2
DOIs
Publication statusPublished - 2001

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