Surface hydride composition of plasma-synthesized si nanoparticles

Bhavin N. Jariwala; Nicolaas J. Kramer; M. Cristina Petcu; David C. Bobela; M.C.M. van de Sanden; Paul Stradins; Cristian V. Ciobanu; Sumit Agarwal

doi:10.1021/jp2028005

Surface hydride composition of plasma-synthesized si nanoparticles

Bhavin N. Jariwala
, Nicolaas J. Kramer
, M. Cristina Petcu
, David C. Bobela
, M.C.M. van de Sanden
, Paul Stradins
, Cristian V. Ciobanu
, Sumit Agarwal

Research output: Contribution to journal › Article › Academic › peer-review

40 Citations (Scopus)

Abstract

We have determined the surface hydride composition of amorphous and crystalline Si nanoparticles (NPs) (3-5 nm) synthesized in a low-temperature SiH₄/Ar plasma using in situ attenuated total reflection Fourier-transform infrared spectroscopy and H₂ thermal effusion measurements. With increasing power to the plasma source, the particles transition from amorphous to crystalline with a corresponding increase in the fraction of SiH species on the surface. The surface hydride composition indicates that Si NPs synthesized at higher plasma powers crystallize in the gas-phase due to a greater degree of plasma-induced heating, which enhances the desorption rates for SiH₂ and SiH₃. Furthermore, these Si NPs do not contain any detectable H in the bulk.

Original language	English
Pages (from-to)	20375-20379
Number of pages	5
Journal	Journal of Physical Chemistry C
Volume	115
Issue number	42
DOIs	https://doi.org/10.1021/jp2028005
Publication status	Published - 27 Oct 2011

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title = "Surface hydride composition of plasma-synthesized si nanoparticles",

abstract = "We have determined the surface hydride composition of amorphous and crystalline Si nanoparticles (NPs) (3-5 nm) synthesized in a low-temperature SiH4/Ar plasma using in situ attenuated total reflection Fourier-transform infrared spectroscopy and H2 thermal effusion measurements. With increasing power to the plasma source, the particles transition from amorphous to crystalline with a corresponding increase in the fraction of SiH species on the surface. The surface hydride composition indicates that Si NPs synthesized at higher plasma powers crystallize in the gas-phase due to a greater degree of plasma-induced heating, which enhances the desorption rates for SiH2 and SiH3. Furthermore, these Si NPs do not contain any detectable H in the bulk.",

author = "Jariwala, \{Bhavin N.\} and Kramer, \{Nicolaas J.\} and Petcu, \{M. Cristina\} and Bobela, \{David C.\} and \{van de Sanden\}, M.C.M. and Paul Stradins and Ciobanu, \{Cristian V.\} and Sumit Agarwal",

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doi = "10.1021/jp2028005",

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AU - Jariwala, Bhavin N.

AU - Kramer, Nicolaas J.

AU - Petcu, M. Cristina

AU - Bobela, David C.

AU - van de Sanden, M.C.M.

AU - Stradins, Paul

AU - Ciobanu, Cristian V.

AU - Agarwal, Sumit

PY - 2011/10/27

Y1 - 2011/10/27

N2 - We have determined the surface hydride composition of amorphous and crystalline Si nanoparticles (NPs) (3-5 nm) synthesized in a low-temperature SiH4/Ar plasma using in situ attenuated total reflection Fourier-transform infrared spectroscopy and H2 thermal effusion measurements. With increasing power to the plasma source, the particles transition from amorphous to crystalline with a corresponding increase in the fraction of SiH species on the surface. The surface hydride composition indicates that Si NPs synthesized at higher plasma powers crystallize in the gas-phase due to a greater degree of plasma-induced heating, which enhances the desorption rates for SiH2 and SiH3. Furthermore, these Si NPs do not contain any detectable H in the bulk.

AB - We have determined the surface hydride composition of amorphous and crystalline Si nanoparticles (NPs) (3-5 nm) synthesized in a low-temperature SiH4/Ar plasma using in situ attenuated total reflection Fourier-transform infrared spectroscopy and H2 thermal effusion measurements. With increasing power to the plasma source, the particles transition from amorphous to crystalline with a corresponding increase in the fraction of SiH species on the surface. The surface hydride composition indicates that Si NPs synthesized at higher plasma powers crystallize in the gas-phase due to a greater degree of plasma-induced heating, which enhances the desorption rates for SiH2 and SiH3. Furthermore, these Si NPs do not contain any detectable H in the bulk.

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DO - 10.1021/jp2028005

M3 - Article

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VL - 115

SP - 20375

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JO - Journal of Physical Chemistry C

JF - Journal of Physical Chemistry C

IS - 42

ER -

Surface hydride composition of plasma-synthesized si nanoparticles

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