Surface hydride composition of plasma-synthesized si nanoparticles

Bhavin N. Jariwala; Nicolaas J. Kramer; M. Cristina Petcu; David C. Bobela; M.C.M. van de Sanden; Paul Stradins; Cristian V. Ciobanu; Sumit Agarwal

doi:10.1021/jp2028005

Surface hydride composition of plasma-synthesized si nanoparticles

Bhavin N. Jariwala, Nicolaas J. Kramer, M. Cristina Petcu, David C. Bobela, M.C.M. van de Sanden, Paul Stradins, Cristian V. Ciobanu, Sumit Agarwal

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Abstract

We have determined the surface hydride composition of amorphous and crystalline Si nanoparticles (NPs) (3-5 nm) synthesized in a low-temperature SiH₄/Ar plasma using in situ attenuated total reflection Fourier-transform infrared spectroscopy and H₂ thermal effusion measurements. With increasing power to the plasma source, the particles transition from amorphous to crystalline with a corresponding increase in the fraction of SiH species on the surface. The surface hydride composition indicates that Si NPs synthesized at higher plasma powers crystallize in the gas-phase due to a greater degree of plasma-induced heating, which enhances the desorption rates for SiH₂ and SiH₃. Furthermore, these Si NPs do not contain any detectable H in the bulk.

Original language	English
Pages (from-to)	20375-20379
Number of pages	5
Journal	Journal of Physical Chemistry C
Volume	115
Issue number	42
DOIs	https://doi.org/10.1021/jp2028005
Publication status	Published - 27 Oct 2011

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@article{d37cb88e7207421190c5960910ff2686,

title = "Surface hydride composition of plasma-synthesized si nanoparticles",

abstract = "We have determined the surface hydride composition of amorphous and crystalline Si nanoparticles (NPs) (3-5 nm) synthesized in a low-temperature SiH4/Ar plasma using in situ attenuated total reflection Fourier-transform infrared spectroscopy and H2 thermal effusion measurements. With increasing power to the plasma source, the particles transition from amorphous to crystalline with a corresponding increase in the fraction of SiH species on the surface. The surface hydride composition indicates that Si NPs synthesized at higher plasma powers crystallize in the gas-phase due to a greater degree of plasma-induced heating, which enhances the desorption rates for SiH2 and SiH3. Furthermore, these Si NPs do not contain any detectable H in the bulk.",

author = "Jariwala, {Bhavin N.} and Kramer, {Nicolaas J.} and Petcu, {M. Cristina} and Bobela, {David C.} and {van de Sanden}, M.C.M. and Paul Stradins and Ciobanu, {Cristian V.} and Sumit Agarwal",

year = "2011",

month = oct,

day = "27",

doi = "10.1021/jp2028005",

language = "English",

volume = "115",

pages = "20375--20379",

journal = "Journal of Physical Chemistry C",

issn = "1932-7447",

publisher = "American Chemical Society",

number = "42",

}

TY - JOUR

T1 - Surface hydride composition of plasma-synthesized si nanoparticles

AU - Jariwala, Bhavin N.

AU - Kramer, Nicolaas J.

AU - Petcu, M. Cristina

AU - Bobela, David C.

AU - van de Sanden, M.C.M.

AU - Stradins, Paul

AU - Ciobanu, Cristian V.

AU - Agarwal, Sumit

PY - 2011/10/27

Y1 - 2011/10/27

N2 - We have determined the surface hydride composition of amorphous and crystalline Si nanoparticles (NPs) (3-5 nm) synthesized in a low-temperature SiH4/Ar plasma using in situ attenuated total reflection Fourier-transform infrared spectroscopy and H2 thermal effusion measurements. With increasing power to the plasma source, the particles transition from amorphous to crystalline with a corresponding increase in the fraction of SiH species on the surface. The surface hydride composition indicates that Si NPs synthesized at higher plasma powers crystallize in the gas-phase due to a greater degree of plasma-induced heating, which enhances the desorption rates for SiH2 and SiH3. Furthermore, these Si NPs do not contain any detectable H in the bulk.

AB - We have determined the surface hydride composition of amorphous and crystalline Si nanoparticles (NPs) (3-5 nm) synthesized in a low-temperature SiH4/Ar plasma using in situ attenuated total reflection Fourier-transform infrared spectroscopy and H2 thermal effusion measurements. With increasing power to the plasma source, the particles transition from amorphous to crystalline with a corresponding increase in the fraction of SiH species on the surface. The surface hydride composition indicates that Si NPs synthesized at higher plasma powers crystallize in the gas-phase due to a greater degree of plasma-induced heating, which enhances the desorption rates for SiH2 and SiH3. Furthermore, these Si NPs do not contain any detectable H in the bulk.

UR - http://www.scopus.com/inward/record.url?scp=80054930447&partnerID=8YFLogxK

U2 - 10.1021/jp2028005

DO - 10.1021/jp2028005

M3 - Article

AN - SCOPUS:80054930447

SN - 1932-7447

VL - 115

SP - 20375

EP - 20379

JO - Journal of Physical Chemistry C

JF - Journal of Physical Chemistry C

IS - 42

ER -

Surface hydride composition of plasma-synthesized si nanoparticles

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