Surface diffusion processes during a-Si:H growth : temperature dependent study of the surface roughness evolution

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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Original language	English
Title of host publication	CIP '2005 abstracts booklet : 15th international colloquium on plasma processes : June 5-9, 2005, Autrans (France)
Place of Publication	Paris
Publisher	SFV
Publication status	Published - 2005

Cite this

@inproceedings{7c6080abff514d36a2152c4e38bd1912,

title = "Surface diffusion processes during a-Si:H growth : temperature dependent study of the surface roughness evolution",

author = "J.P.M. Hoefnagels and W.M.M. Kessels and \{Sanden, van de\}, M.C.M.",

year = "2005",

language = "English",

booktitle = "CIP '2005 abstracts booklet : 15th international colloquium on plasma processes : June 5-9, 2005, Autrans (France)",

publisher = "SFV",

}

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Surface diffusion processes during a-Si:H growth : temperature dependent study of the surface roughness evolution

AU - Hoefnagels, J.P.M.

AU - Kessels, W.M.M.

AU - Sanden, van de, M.C.M.

PY - 2005

Y1 - 2005

M3 - Conference contribution

BT - CIP '2005 abstracts booklet : 15th international colloquium on plasma processes : June 5-9, 2005, Autrans (France)

PB - SFV

CY - Paris

ER -