Surface chemistry of plasma assisted ALD of AI2O3 at low deposition temperatures

E. Langereis; J. Keijmel; M. Bouman; M.C.M. Sanden, van de; W.M.M. Kessels

Surface chemistry of plasma assisted ALD of AI2O3 at low deposition temperatures

E. Langereis, J. Keijmel, M. Bouman, M.C.M. Sanden, van de, W.M.M. Kessels

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	English
Title of host publication	Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts)
Editors	W.M.M. Kessels, A. Delabie
Place of Publication	S.n.
Publisher	s.n.
Pages	MonM2-3-
Publication status	Published - 2008

Cite this

Langereis, E., Keijmel, J., Bouman, M., Sanden, van de, M. C. M., & Kessels, W. M. M. (2008). Surface chemistry of plasma assisted ALD of AI2O3 at low deposition temperatures. In W. M. M. Kessels, & A. Delabie (Eds.), Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts) (pp. MonM2-3-). s.n..

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title = "Surface chemistry of plasma assisted ALD of AI2O3 at low deposition temperatures",

author = "E. Langereis and J. Keijmel and M. Bouman and {Sanden, van de}, M.C.M. and W.M.M. Kessels",

year = "2008",

language = "English",

pages = "MonM2--3--",

editor = "W.M.M. Kessels and A. Delabie",

booktitle = "Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts)",

publisher = "s.n.",

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Surface chemistry of plasma assisted ALD of AI2O3 at low deposition temperatures. / Langereis, E.; Keijmel, J.; Bouman, M. et al.
Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts). ed. / W.M.M. Kessels; A. Delabie. S.n.: s.n., 2008. p. MonM2-3-.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Surface chemistry of plasma assisted ALD of AI2O3 at low deposition temperatures

AU - Langereis, E.

AU - Keijmel, J.

AU - Bouman, M.

AU - Sanden, van de, M.C.M.

AU - Kessels, W.M.M.

PY - 2008

Y1 - 2008

M3 - Conference contribution

SP - MonM2-3-

BT - Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts)

A2 - Kessels, W.M.M.

A2 - Delabie, A.

PB - s.n.

CY - S.n.

ER -