Surface chemistry of plasma assisted ALD of AI2O3 at low deposition temperatures

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Original languageEnglish
Title of host publicationProceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts)
EditorsW.M.M. Kessels, A. Delabie
Place of PublicationS.n.
Publishers.n.
PagesMonM2-3-
Publication statusPublished - 2008

Cite this

Langereis, E., Keijmel, J., Bouman, M., Sanden, van de, M. C. M., & Kessels, W. M. M. (2008). Surface chemistry of plasma assisted ALD of AI2O3 at low deposition temperatures. In W. M. M. Kessels, & A. Delabie (Eds.), Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts) (pp. MonM2-3-). S.n.: s.n..
Langereis, E. ; Keijmel, J. ; Bouman, M. ; Sanden, van de, M.C.M. ; Kessels, W.M.M. / Surface chemistry of plasma assisted ALD of AI2O3 at low deposition temperatures. Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts). editor / W.M.M. Kessels ; A. Delabie. S.n. : s.n., 2008. pp. MonM2-3-
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title = "Surface chemistry of plasma assisted ALD of AI2O3 at low deposition temperatures",
author = "E. Langereis and J. Keijmel and M. Bouman and {Sanden, van de}, M.C.M. and W.M.M. Kessels",
year = "2008",
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pages = "MonM2--3--",
editor = "W.M.M. Kessels and A. Delabie",
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Langereis, E, Keijmel, J, Bouman, M, Sanden, van de, MCM & Kessels, WMM 2008, Surface chemistry of plasma assisted ALD of AI2O3 at low deposition temperatures. in WMM Kessels & A Delabie (eds), Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts). s.n., S.n., pp. MonM2-3-.

Surface chemistry of plasma assisted ALD of AI2O3 at low deposition temperatures. / Langereis, E.; Keijmel, J.; Bouman, M.; Sanden, van de, M.C.M.; Kessels, W.M.M.

Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts). ed. / W.M.M. Kessels; A. Delabie. S.n. : s.n., 2008. p. MonM2-3-.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

TY - GEN

T1 - Surface chemistry of plasma assisted ALD of AI2O3 at low deposition temperatures

AU - Langereis, E.

AU - Keijmel, J.

AU - Bouman, M.

AU - Sanden, van de, M.C.M.

AU - Kessels, W.M.M.

PY - 2008

Y1 - 2008

M3 - Conference contribution

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BT - Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts)

A2 - Kessels, W.M.M.

A2 - Delabie, A.

PB - s.n.

CY - S.n.

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Langereis E, Keijmel J, Bouman M, Sanden, van de MCM, Kessels WMM. Surface chemistry of plasma assisted ALD of AI2O3 at low deposition temperatures. In Kessels WMM, Delabie A, editors, Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts). S.n.: s.n. 2008. p. MonM2-3-