Surface characterization of SiO2 layers deposited using atmospheric pressure plasma enhanced chemical vapour deposition (AP PECVD)

P.A. Premkumar, S.A. Starostin, H. Vries, de, R.M.J. Paffen

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Fingerprint

Dive into the research topics of 'Surface characterization of SiO2 layers deposited using atmospheric pressure plasma enhanced chemical vapour deposition (AP PECVD)'. Together they form a unique fingerprint.

Physics & Astronomy