Surface characterization of SiO2 layers deposited using atmospheric pressure plasma enhanced chemical vapour deposition (AP PECVD)

P.A. Premkumar, S.A. Starostin, H. Vries, de, R.M.J. Paffen

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Abstract

No abstract
Original languageEnglish
Title of host publicationProceedings of ICTF14 & RSD2008 : Ghent, Belgium, 17-20 November 2008
EditorsR. De Gryse, D. Depla, D. Poelman, S. Mathieu, W.P. Leroy, H. Poelman
Place of PublicationGhent
Pages344-344
Publication statusPublished - 2008
Eventconference; International Conference on Thin Films (ICTF), Ghent Reactive Sputter Deposition Symposium (RSD); 2008-11-17; 2008-11-20 -
Duration: 17 Nov 200820 Nov 2008

Conference

Conferenceconference; International Conference on Thin Films (ICTF), Ghent Reactive Sputter Deposition Symposium (RSD); 2008-11-17; 2008-11-20
Period17/11/0820/11/08
OtherInternational Conference on Thin Films (ICTF), Ghent Reactive Sputter Deposition Symposium (RSD)

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