Surface characterization of SiO2 layers deposited using atmospheric pressure plasma enhanced chemical vapour deposition (AP PECVD)

P.A. Premkumar; S.A. Starostin; H. Vries, de; R.M.J. Paffen

Surface characterization of SiO2 layers deposited using atmospheric pressure plasma enhanced chemical vapour deposition (AP PECVD)

P.A. Premkumar, S.A. Starostin, H. Vries, de, R.M.J. Paffen

Plasma & Materials Processing

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Abstract

No abstract

Original language	English
Title of host publication	Proceedings of ICTF14 & RSD2008 : Ghent, Belgium, 17-20 November 2008
Editors	R. De Gryse, D. Depla, D. Poelman, S. Mathieu, W.P. Leroy, H. Poelman
Place of Publication	Ghent
Pages	344-344
Publication status	Published - 2008
Event	conference; International Conference on Thin Films (ICTF), Ghent Reactive Sputter Deposition Symposium (RSD); 2008-11-17; 2008-11-20 - Duration: 17 Nov 2008 → 20 Nov 2008

Conference

Conference	conference; International Conference on Thin Films (ICTF), Ghent Reactive Sputter Deposition Symposium (RSD); 2008-11-17; 2008-11-20
Period	17/11/08 → 20/11/08
Other	International Conference on Thin Films (ICTF), Ghent Reactive Sputter Deposition Symposium (RSD)

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Premkumar, P. A., Starostin, S. A., Vries, de, H., & Paffen, R. M. J. (2008). Surface characterization of SiO2 layers deposited using atmospheric pressure plasma enhanced chemical vapour deposition (AP PECVD). In R. De Gryse, D. Depla, D. Poelman, S. Mathieu, W. P. Leroy, & H. Poelman (Eds.), Proceedings of ICTF14 & RSD2008 : Ghent, Belgium, 17-20 November 2008 (pp. 344-344).

Premkumar, P.A. ; Starostin, S.A. ; Vries, de, H. et al. / Surface characterization of SiO2 layers deposited using atmospheric pressure plasma enhanced chemical vapour deposition (AP PECVD). Proceedings of ICTF14 & RSD2008 : Ghent, Belgium, 17-20 November 2008. editor / R. De Gryse ; D. Depla ; D. Poelman ; S. Mathieu ; W.P. Leroy ; H. Poelman. Ghent, 2008. pp. 344-344

@inproceedings{2a021b3d63eb4f8093350a7ee25242b2,

title = "Surface characterization of SiO2 layers deposited using atmospheric pressure plasma enhanced chemical vapour deposition (AP PECVD)",

abstract = "No abstract",

author = "P.A. Premkumar and S.A. Starostin and {Vries, de}, H. and R.M.J. Paffen",

year = "2008",

language = "English",

isbn = "978-90-334-7347-0",

pages = "344--344",

editor = "{De Gryse}, R. and D. Depla and D. Poelman and S. Mathieu and W.P. Leroy and H. Poelman",

booktitle = "Proceedings of ICTF14 & RSD2008 : Ghent, Belgium, 17-20 November 2008",

note = "conference; International Conference on Thin Films (ICTF), Ghent Reactive Sputter Deposition Symposium (RSD); 2008-11-17; 2008-11-20 ; Conference date: 17-11-2008 Through 20-11-2008",

}

Premkumar, PA, Starostin, SA, Vries, de, H & Paffen, RMJ 2008, Surface characterization of SiO2 layers deposited using atmospheric pressure plasma enhanced chemical vapour deposition (AP PECVD). in R De Gryse, D Depla, D Poelman, S Mathieu, WP Leroy & H Poelman (eds), Proceedings of ICTF14 & RSD2008 : Ghent, Belgium, 17-20 November 2008. Ghent, pp. 344-344, conference; International Conference on Thin Films (ICTF), Ghent Reactive Sputter Deposition Symposium (RSD); 2008-11-17; 2008-11-20, 17/11/08.

Surface characterization of SiO2 layers deposited using atmospheric pressure plasma enhanced chemical vapour deposition (AP PECVD). / Premkumar, P.A.; Starostin, S.A.; Vries, de, H. et al.
Proceedings of ICTF14 & RSD2008 : Ghent, Belgium, 17-20 November 2008. ed. / R. De Gryse; D. Depla; D. Poelman; S. Mathieu; W.P. Leroy; H. Poelman. Ghent, 2008. p. 344-344.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Surface characterization of SiO2 layers deposited using atmospheric pressure plasma enhanced chemical vapour deposition (AP PECVD)

AU - Premkumar, P.A.

AU - Starostin, S.A.

AU - Vries, de, H.

AU - Paffen, R.M.J.

PY - 2008

Y1 - 2008

N2 - No abstract

AB - No abstract

M3 - Conference contribution

SN - 978-90-334-7347-0

SP - 344

EP - 344

BT - Proceedings of ICTF14 & RSD2008 : Ghent, Belgium, 17-20 November 2008

A2 - De Gryse, R.

A2 - Depla, D.

A2 - Poelman, D.

A2 - Mathieu, S.

A2 - Leroy, W.P.

A2 - Poelman, H.

CY - Ghent

T2 - conference; International Conference on Thin Films (ICTF), Ghent Reactive Sputter Deposition Symposium (RSD); 2008-11-17; 2008-11-20

Y2 - 17 November 2008 through 20 November 2008

ER -

Surface characterization of SiO2 layers deposited using atmospheric pressure plasma enhanced chemical vapour deposition (AP PECVD)

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