Substrate temperature dependence of the roughness evolution of HWCVD a-Si:H studied by real-time spectroscopic ellipsometry

Research output: Contribution to journalArticleAcademicpeer-review

17 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Substrate temperature dependence of the roughness evolution of HWCVD a-Si:H studied by real-time spectroscopic ellipsometry'. Together they form a unique fingerprint.

Material Science