| Original language | English |
|---|---|
| Title of host publication | 3rd international conference on hot-wire CVD (Cat-CVD) process : August 23-27, 2004, Utrecht, The Netherlands : extended abstracts |
| Place of Publication | S.n. |
| Publisher | s.n. |
| Pages | 41-44 |
| Publication status | Published - 2004 |
Cite this
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Substrate temperature dependence of the roughness evolution of HWCVD a-Si:H studied by real-time spectroscopic ellipsometry. / Hoefnagels, J.P.M.; Langereis, E.; Sanden, van de, M.C.M.; Kessels, W.M.M.
3rd international conference on hot-wire CVD (Cat-CVD) process : August 23-27, 2004, Utrecht, The Netherlands : extended abstracts. S.n. : s.n., 2004. p. 41-44.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review
TY - GEN
T1 - Substrate temperature dependence of the roughness evolution of HWCVD a-Si:H studied by real-time spectroscopic ellipsometry
AU - Hoefnagels, J.P.M.
AU - Langereis, E.
AU - Sanden, van de, M.C.M.
AU - Kessels, W.M.M.
PY - 2004
Y1 - 2004
M3 - Conference contribution
SP - 41
EP - 44
BT - 3rd international conference on hot-wire CVD (Cat-CVD) process : August 23-27, 2004, Utrecht, The Netherlands : extended abstracts
PB - s.n.
CY - S.n.
ER -