Substrate temperature dependence of the roughness evolution of HWCVD a-Si:H studied by real-time spectroscopic ellipsometry

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

1 Downloads (Pure)
Original languageEnglish
Title of host publication3rd international conference on hot-wire CVD (Cat-CVD) process : August 23-27, 2004, Utrecht, The Netherlands : extended abstracts
Place of PublicationS.n.
Publishers.n.
Pages41-44
Publication statusPublished - 2004

Cite this

Hoefnagels, J. P. M., Langereis, E., Sanden, van de, M. C. M., & Kessels, W. M. M. (2004). Substrate temperature dependence of the roughness evolution of HWCVD a-Si:H studied by real-time spectroscopic ellipsometry. In 3rd international conference on hot-wire CVD (Cat-CVD) process : August 23-27, 2004, Utrecht, The Netherlands : extended abstracts (pp. 41-44). S.n.: s.n..
Hoefnagels, J.P.M. ; Langereis, E. ; Sanden, van de, M.C.M. ; Kessels, W.M.M. / Substrate temperature dependence of the roughness evolution of HWCVD a-Si:H studied by real-time spectroscopic ellipsometry. 3rd international conference on hot-wire CVD (Cat-CVD) process : August 23-27, 2004, Utrecht, The Netherlands : extended abstracts. S.n. : s.n., 2004. pp. 41-44
@inproceedings{c0278284c43f44668106a93f9e8960c1,
title = "Substrate temperature dependence of the roughness evolution of HWCVD a-Si:H studied by real-time spectroscopic ellipsometry",
author = "J.P.M. Hoefnagels and E. Langereis and {Sanden, van de}, M.C.M. and W.M.M. Kessels",
year = "2004",
language = "English",
pages = "41--44",
booktitle = "3rd international conference on hot-wire CVD (Cat-CVD) process : August 23-27, 2004, Utrecht, The Netherlands : extended abstracts",
publisher = "s.n.",

}

Hoefnagels, JPM, Langereis, E, Sanden, van de, MCM & Kessels, WMM 2004, Substrate temperature dependence of the roughness evolution of HWCVD a-Si:H studied by real-time spectroscopic ellipsometry. in 3rd international conference on hot-wire CVD (Cat-CVD) process : August 23-27, 2004, Utrecht, The Netherlands : extended abstracts. s.n., S.n., pp. 41-44.

Substrate temperature dependence of the roughness evolution of HWCVD a-Si:H studied by real-time spectroscopic ellipsometry. / Hoefnagels, J.P.M.; Langereis, E.; Sanden, van de, M.C.M.; Kessels, W.M.M.

3rd international conference on hot-wire CVD (Cat-CVD) process : August 23-27, 2004, Utrecht, The Netherlands : extended abstracts. S.n. : s.n., 2004. p. 41-44.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

TY - GEN

T1 - Substrate temperature dependence of the roughness evolution of HWCVD a-Si:H studied by real-time spectroscopic ellipsometry

AU - Hoefnagels, J.P.M.

AU - Langereis, E.

AU - Sanden, van de, M.C.M.

AU - Kessels, W.M.M.

PY - 2004

Y1 - 2004

M3 - Conference contribution

SP - 41

EP - 44

BT - 3rd international conference on hot-wire CVD (Cat-CVD) process : August 23-27, 2004, Utrecht, The Netherlands : extended abstracts

PB - s.n.

CY - S.n.

ER -

Hoefnagels JPM, Langereis E, Sanden, van de MCM, Kessels WMM. Substrate temperature dependence of the roughness evolution of HWCVD a-Si:H studied by real-time spectroscopic ellipsometry. In 3rd international conference on hot-wire CVD (Cat-CVD) process : August 23-27, 2004, Utrecht, The Netherlands : extended abstracts. S.n.: s.n. 2004. p. 41-44