Substrate temperature dependence of the roughness evolution of HWCVD a-Si:H studied by real-time spectroscopic ellipsometry

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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Original language	English
Title of host publication	3rd international conference on hot-wire CVD (Cat-CVD) process : August 23-27, 2004, Utrecht, The Netherlands : extended abstracts
Place of Publication	S.n.
Publisher	s.n.
Pages	41-44
Publication status	Published - 2004

Cite this

@inproceedings{c0278284c43f44668106a93f9e8960c1,

title = "Substrate temperature dependence of the roughness evolution of HWCVD a-Si:H studied by real-time spectroscopic ellipsometry",

author = "J.P.M. Hoefnagels and E. Langereis and \{Sanden, van de\}, M.C.M. and W.M.M. Kessels",

year = "2004",

language = "English",

pages = "41--44",

booktitle = "3rd international conference on hot-wire CVD (Cat-CVD) process : August 23-27, 2004, Utrecht, The Netherlands : extended abstracts",

publisher = "s.n.",

}

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Substrate temperature dependence of the roughness evolution of HWCVD a-Si:H studied by real-time spectroscopic ellipsometry

AU - Hoefnagels, J.P.M.

AU - Langereis, E.

AU - Sanden, van de, M.C.M.

AU - Kessels, W.M.M.

PY - 2004

Y1 - 2004

M3 - Conference contribution

SP - 41

EP - 44

BT - 3rd international conference on hot-wire CVD (Cat-CVD) process : August 23-27, 2004, Utrecht, The Netherlands : extended abstracts

PB - s.n.

CY - S.n.

ER -