Substrate temperature dependence of the roughness evolution of HWCVD a-Si:H studied by real-time spectroscopic ellipsometry

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

1 Downloads (Pure)
Original languageEnglish
Title of host publication3rd international conference on hot-wire CVD (Cat-CVD) process : August 23-27, 2004, Utrecht, The Netherlands : extended abstracts
Place of PublicationS.n.
Publishers.n.
Pages41-44
Publication statusPublished - 2004

Cite this