Substrate structure grown by plasma deposition

H.W. Vries, de; M.C.M. Sanden, van de

Substrate structure grown by plasma deposition

H.W. Vries, de (Inventor), M.C.M. Sanden, van de (Inventor)

Plasma & Materials Processing

Research output: Patent › Patent publication

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Abstract

Substrate structure comprising a substrate (6) and a plasma grown layer (6a). The surface of the resulting substrate structure (7) is characterized by interrelated scaling components. The scaling components comprise a roughness exponent a, a growth exponent ss and a dynamic exponent z, wherein the growth exponent ss has a value of less than 0.2 and the dynamic exponent z has a value of more than 6. Also disclosed is a method to provide such a substrate structure.

Original language	English
Patent number	WO2010142972
Publication status	Published - 16 Dec 2010

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title = "Substrate structure grown by plasma deposition",

abstract = "Substrate structure comprising a substrate (6) and a plasma grown layer (6a). The surface of the resulting substrate structure (7) is characterized by interrelated scaling components. The scaling components comprise a roughness exponent a, a growth exponent ss and a dynamic exponent z, wherein the growth exponent ss has a value of less than 0.2 and the dynamic exponent z has a value of more than 6. Also disclosed is a method to provide such a substrate structure.",

author = "{Vries, de}, H.W. and {Sanden, van de}, M.C.M.",

year = "2010",

month = dec,

day = "16",

language = "English",

type = "Patent",

note = "WO2010142972",

}

TY - PAT

T1 - Substrate structure grown by plasma deposition

AU - Vries, de, H.W.

AU - Sanden, van de, M.C.M.

PY - 2010/12/16

Y1 - 2010/12/16

N2 - Substrate structure comprising a substrate (6) and a plasma grown layer (6a). The surface of the resulting substrate structure (7) is characterized by interrelated scaling components. The scaling components comprise a roughness exponent a, a growth exponent ss and a dynamic exponent z, wherein the growth exponent ss has a value of less than 0.2 and the dynamic exponent z has a value of more than 6. Also disclosed is a method to provide such a substrate structure.

AB - Substrate structure comprising a substrate (6) and a plasma grown layer (6a). The surface of the resulting substrate structure (7) is characterized by interrelated scaling components. The scaling components comprise a roughness exponent a, a growth exponent ss and a dynamic exponent z, wherein the growth exponent ss has a value of less than 0.2 and the dynamic exponent z has a value of more than 6. Also disclosed is a method to provide such a substrate structure.

UR - http://v3.espacenet.com/publicationDetails/biblio?CC=WO&NR=2010142972A1&KC=A1&FT=D&date=20101216&DB=EPODOC&locale=nl_nl#

M3 - Patent publication

M1 - WO2010142972

ER -

Substrate structure grown by plasma deposition

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