Sub-5 nm patterning by directed self-assembly of oligo(Dimethylsiloxane) liquid crystal thin films

K. Nickmans, J.N. Murphy, S.A.J. de Waal, P. Leclere, J. Doise, R. Gronheid, D.J. Broer, A.P.H.J. Schenning

Research output: Contribution to journalArticleAcademicpeer-review

36 Citations (Scopus)
107 Downloads (Pure)
Original languageEnglish
Pages (from-to)10068-10072
Number of pages5
JournalAdvanced Materials
Volume28
Issue number45
DOIs
Publication statusPublished - 7 Dec 2016

Keywords

  • directed self-assembly
  • graphoepitaxy
  • high-χ low-N
  • liquid crystals
  • nanolithography
  • nanopatterning
  • oligo(dimethylsiloxane)

Cite this

Nickmans, K. ; Murphy, J.N. ; de Waal, S.A.J. ; Leclere, P. ; Doise, J. ; Gronheid, R. ; Broer, D.J. ; Schenning, A.P.H.J. / Sub-5 nm patterning by directed self-assembly of oligo(Dimethylsiloxane) liquid crystal thin films. In: Advanced Materials. 2016 ; Vol. 28, No. 45. pp. 10068-10072.
@article{8c5041f625164a6db0a70276eb6faa0e,
title = "Sub-5 nm patterning by directed self-assembly of oligo(Dimethylsiloxane) liquid crystal thin films",
keywords = "directed self-assembly, graphoepitaxy, high-χ low-N, liquid crystals, nanolithography, nanopatterning, oligo(dimethylsiloxane)",
author = "K. Nickmans and J.N. Murphy and {de Waal}, S.A.J. and P. Leclere and J. Doise and R. Gronheid and D.J. Broer and A.P.H.J. Schenning",
year = "2016",
month = "12",
day = "7",
doi = "10.1002/adma.201602891",
language = "English",
volume = "28",
pages = "10068--10072",
journal = "Advanced Materials",
issn = "0935-9648",
publisher = "Wiley-VCH Verlag",
number = "45",

}

Sub-5 nm patterning by directed self-assembly of oligo(Dimethylsiloxane) liquid crystal thin films. / Nickmans, K.; Murphy, J.N.; de Waal, S.A.J.; Leclere, P.; Doise, J.; Gronheid, R.; Broer, D.J.; Schenning, A.P.H.J.

In: Advanced Materials, Vol. 28, No. 45, 07.12.2016, p. 10068-10072.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Sub-5 nm patterning by directed self-assembly of oligo(Dimethylsiloxane) liquid crystal thin films

AU - Nickmans, K.

AU - Murphy, J.N.

AU - de Waal, S.A.J.

AU - Leclere, P.

AU - Doise, J.

AU - Gronheid, R.

AU - Broer, D.J.

AU - Schenning, A.P.H.J.

PY - 2016/12/7

Y1 - 2016/12/7

KW - directed self-assembly

KW - graphoepitaxy

KW - high-χ low-N

KW - liquid crystals

KW - nanolithography

KW - nanopatterning

KW - oligo(dimethylsiloxane)

UR - http://www.scopus.com/inward/record.url?scp=84990049621&partnerID=8YFLogxK

U2 - 10.1002/adma.201602891

DO - 10.1002/adma.201602891

M3 - Article

C2 - 27689779

AN - SCOPUS:84990049621

VL - 28

SP - 10068

EP - 10072

JO - Advanced Materials

JF - Advanced Materials

SN - 0935-9648

IS - 45

ER -