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Study on the mechanism of polymer etching in Ar and O2 RF plasmas

  • J.A.G. Baggerman
  • , E.J.H. Collart
  • , R.J. Visser

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

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Original languageEnglish
Title of host publication5th international symposium on Laser-aided plasma diagnostics : proceedings, Physikzentrum, Bad-Honnef, August 19-23, 1991
Place of PublicationJülich
PublisherForschungszentrum Jülich
Pages224-229
ISBN (Print)3-89336-075-1
Publication statusPublished - 1991
Externally publishedYes

Publication series

NameKonferenzen des Forschungszentrums Jülich
Volume9
ISSN (Print)0938-6521

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