Study of temperature programmed desorption of silicon nitride and sialon by means of mass spectrometry

Chen Mingyuan, J.W.T. Rutten, van, R. Metselaar

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Abstract

Temperature programmed desorption (TPD) by means of mass spectrometry was used to study the species, adsorbed on the surface of silicon nitride powders made ln dlfferent ways and ß-sialo n made in this laboratory. Several methods were used to treat the powders. The results indicate that the main specles des orbed are NH3, NH2, H2 N2 and H2O which are adsorbed at sites with different binding energies. Treatment wlth water and propanol can't remove the adsorbed species effectively. Heating in vacuum removes the adsorbed specles completely. Heatlng ln nitrogen removes most of the adsorbed species. A mechanism about adsorption and desorption is proposed to explaln the phenomena.
Original languageEnglish
Title of host publicationThird EURO-Ceramics : vol. 1 : Proceedings of ceramics : Proceedings of the third European Ceramic Society Conference (THIRD ECerS), held on 12-17 September 1993 at the Madrid Congress & Exhibition Centre, Spain
EditorsP. Durán, J.F. Fernández
Place of PublicationCastellón de la Plana
PublisherFaenza Editrice Iberica
Pages597-602
ISBN (Print)84-87683-05-3
Publication statusPublished - 1993

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Mingyuan, C., Rutten, van, J. W. T., & Metselaar, R. (1993). Study of temperature programmed desorption of silicon nitride and sialon by means of mass spectrometry. In P. Durán, & J. F. Fernández (Eds.), Third EURO-Ceramics : vol. 1 : Proceedings of ceramics : Proceedings of the third European Ceramic Society Conference (THIRD ECerS), held on 12-17 September 1993 at the Madrid Congress & Exhibition Centre, Spain (pp. 597-602). Castellón de la Plana: Faenza Editrice Iberica.