Studies of the temporal behaviour of a pulsed magnetron deposition discharge

Th. Welzel, Th. Dunger, S. Welzel, H. Kupfer, F. Richter

Research output: Contribution to journalArticleAcademicpeer-review

10 Citations (Scopus)

Abstract

A mid-frequency asymmetric-bipolar pulsed magnetron sputtering system in the frequency range from 100 to 300 kHz has been investigated by a combined application of a Langmuir double probe and optical emission spectroscopy. Both methods have been applied on a time-resolved basis to obtain information about the temporal evolution of the discharge during the pulse. In earlier papers, we have shown by Langmuir probe measurement that a typical two-peak structure of the plasma density at the beginning of the "on" phase occurs which is dependent on the pulse parameters. In this paper, we report on the confirmation of this structure by optical emission spectroscopy which yields a similar structure but with a weaker leading maximum. The studies reveal that the argon emission at 750.4 nm is best suited to monitor temporal changes in the electron density.
Original languageEnglish
Pages (from-to)630-633
Number of pages4
JournalSurface and Coatings Technology
Volume200
Issue number1-4
DOIs
Publication statusPublished - 2005

Fingerprint

Optical emission spectroscopy
optical emission spectroscopy
Langmuir probes
Argon
Plasma density
electrostatic probes
pulses
Magnetron sputtering
plasma density
Carrier concentration
magnetron sputtering
frequency ranges
argon
probes

Cite this

Welzel, Th. ; Dunger, Th. ; Welzel, S. ; Kupfer, H. ; Richter, F. / Studies of the temporal behaviour of a pulsed magnetron deposition discharge. In: Surface and Coatings Technology. 2005 ; Vol. 200, No. 1-4. pp. 630-633.
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Studies of the temporal behaviour of a pulsed magnetron deposition discharge. / Welzel, Th.; Dunger, Th.; Welzel, S.; Kupfer, H.; Richter, F.

In: Surface and Coatings Technology, Vol. 200, No. 1-4, 2005, p. 630-633.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Studies of the temporal behaviour of a pulsed magnetron deposition discharge

AU - Welzel, Th.

AU - Dunger, Th.

AU - Welzel, S.

AU - Kupfer, H.

AU - Richter, F.

PY - 2005

Y1 - 2005

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AB - A mid-frequency asymmetric-bipolar pulsed magnetron sputtering system in the frequency range from 100 to 300 kHz has been investigated by a combined application of a Langmuir double probe and optical emission spectroscopy. Both methods have been applied on a time-resolved basis to obtain information about the temporal evolution of the discharge during the pulse. In earlier papers, we have shown by Langmuir probe measurement that a typical two-peak structure of the plasma density at the beginning of the "on" phase occurs which is dependent on the pulse parameters. In this paper, we report on the confirmation of this structure by optical emission spectroscopy which yields a similar structure but with a weaker leading maximum. The studies reveal that the argon emission at 750.4 nm is best suited to monitor temporal changes in the electron density.

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DO - 10.1016/j.surfcoat.2005.01.041

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EP - 633

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

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