Structured, hydrophobic coatings and ink films with elevations and recesses containing silsesquioxane cage compounds and their manufacture and uses

A. Kuehnle (Inventor), C. Jost (Inventor), B. Schleich (Inventor), E. Nun (Inventor), F.G. Schmidt (Inventor), H.C.L. Abbenhuis (Inventor)

Research output: PatentPatent publication

Abstract

The invention concerns structured surfaces with elevations and recesses, which contain polyhedral oligomeric silicon oxygen cluster units. Such surfaces can contain e.g. hydrophobic, abrasion and scratch-proof characteristics and/or self-cleaning characteristics. Likewise such surfaces can be overcoated with an antireflection film. The surfaces according to invention are formed by fixing polyhedral oligomeric silicon-oxygen cluster compds. a surface. These compds. are applied to the surfaces as additives in coatings and inks. A typical silsesquioxane cage was manufd. by stirring 446 g iso-BuSi(OMe)3 in 4300 mL MeCO with 6.4 g KOH in 200 mL water for 3 days. [on SciFinder (R)]
Original languageEnglish
Publication statusPublished - 18 Jun 2003

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Ink
Coatings
Patents and inventions
Silicon
Oxygen
Abrasion
Cleaning
Water

Cite this

Kuehnle, A. (Inventor) ; Jost, C. (Inventor) ; Schleich, B. (Inventor) ; Nun, E. (Inventor) ; Schmidt, F.G. (Inventor) ; Abbenhuis, H.C.L. (Inventor). / Structured, hydrophobic coatings and ink films with elevations and recesses containing silsesquioxane cage compounds and their manufacture and uses.
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title = "Structured, hydrophobic coatings and ink films with elevations and recesses containing silsesquioxane cage compounds and their manufacture and uses",
abstract = "The invention concerns structured surfaces with elevations and recesses, which contain polyhedral oligomeric silicon oxygen cluster units. Such surfaces can contain e.g. hydrophobic, abrasion and scratch-proof characteristics and/or self-cleaning characteristics. Likewise such surfaces can be overcoated with an antireflection film. The surfaces according to invention are formed by fixing polyhedral oligomeric silicon-oxygen cluster compds. a surface. These compds. are applied to the surfaces as additives in coatings and inks. A typical silsesquioxane cage was manufd. by stirring 446 g iso-BuSi(OMe)3 in 4300 mL MeCO with 6.4 g KOH in 200 mL water for 3 days. [on SciFinder (R)]",
author = "A. Kuehnle and C. Jost and B. Schleich and E. Nun and F.G. Schmidt and H.C.L. Abbenhuis",
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Structured, hydrophobic coatings and ink films with elevations and recesses containing silsesquioxane cage compounds and their manufacture and uses. / Kuehnle, A. (Inventor); Jost, C. (Inventor); Schleich, B. (Inventor); Nun, E. (Inventor); Schmidt, F.G. (Inventor); Abbenhuis, H.C.L. (Inventor).

Research output: PatentPatent publication

TY - PAT

T1 - Structured, hydrophobic coatings and ink films with elevations and recesses containing silsesquioxane cage compounds and their manufacture and uses

AU - Kuehnle, A.

AU - Jost, C.

AU - Schleich, B.

AU - Nun, E.

AU - Schmidt, F.G.

AU - Abbenhuis, H.C.L.

PY - 2003/6/18

Y1 - 2003/6/18

N2 - The invention concerns structured surfaces with elevations and recesses, which contain polyhedral oligomeric silicon oxygen cluster units. Such surfaces can contain e.g. hydrophobic, abrasion and scratch-proof characteristics and/or self-cleaning characteristics. Likewise such surfaces can be overcoated with an antireflection film. The surfaces according to invention are formed by fixing polyhedral oligomeric silicon-oxygen cluster compds. a surface. These compds. are applied to the surfaces as additives in coatings and inks. A typical silsesquioxane cage was manufd. by stirring 446 g iso-BuSi(OMe)3 in 4300 mL MeCO with 6.4 g KOH in 200 mL water for 3 days. [on SciFinder (R)]

AB - The invention concerns structured surfaces with elevations and recesses, which contain polyhedral oligomeric silicon oxygen cluster units. Such surfaces can contain e.g. hydrophobic, abrasion and scratch-proof characteristics and/or self-cleaning characteristics. Likewise such surfaces can be overcoated with an antireflection film. The surfaces according to invention are formed by fixing polyhedral oligomeric silicon-oxygen cluster compds. a surface. These compds. are applied to the surfaces as additives in coatings and inks. A typical silsesquioxane cage was manufd. by stirring 446 g iso-BuSi(OMe)3 in 4300 mL MeCO with 6.4 g KOH in 200 mL water for 3 days. [on SciFinder (R)]

M3 - Patent publication

ER -