Structure-related intercalation behaviour of LiCoO2 films

P.J. Bouwman; B. A. Boukamp; H. J.M. Bouwmeester; P. H.L. Notten

doi:10.1016/S0167-2738(02)00298-9

Structure-related intercalation behaviour of LiCoO₂ films

P.J. Bouwman (Corresponding author)
, B. A. Boukamp
, H. J.M. Bouwmeester
, P. H.L. Notten

Research output: Contribution to journal › Article › Academic › peer-review

62 Citations (Scopus)

Abstract

Submicron films of LiCoO₂ have been deposited on silicon and stainless steel substrates using RF sputtering and pulsed laser deposition (PLD). Both films show preferred orientation. RF films have their Li diffusion plane oriented favourably, that is, perpendicular to the surface, while PLD films show a parallel, c-axis orientation. Electrochemical experiments indicate a strong dependence of the intercalation rate on the alignment of the host structure toward the electrolyte solution. Lithographic patterning enhances the inferior intercalation properties of the PLD film on silicon, as does the utilisation of stainless steel substrates.

Original language	English
Pages (from-to)	181-188
Number of pages	8
Journal	Solid State Ionics
Volume	152-153
DOIs	https://doi.org/10.1016/S0167-2738(02)00298-9
Publication status	Published - 1 Dec 2002

Funding

This research was made possible due to financial support from FOM. The authors are indebted to Philips Research Laboratory for technical support on sample preparation and characterization. Special thanks are due to J.F.M. Cillessen for operation and assistance on the PLD equipment, H. Koster for the SEM analysis; the Philips CFT department for the XRD measurements.

Keywords

Intercalation
LiCoO
Preferential orientation
Thin film

Access to Document

10.1016/S0167-2738(02)00298-9

Cite this

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title = "Structure-related intercalation behaviour of LiCoO2 films",

abstract = "Submicron films of LiCoO2 have been deposited on silicon and stainless steel substrates using RF sputtering and pulsed laser deposition (PLD). Both films show preferred orientation. RF films have their Li diffusion plane oriented favourably, that is, perpendicular to the surface, while PLD films show a parallel, c-axis orientation. Electrochemical experiments indicate a strong dependence of the intercalation rate on the alignment of the host structure toward the electrolyte solution. Lithographic patterning enhances the inferior intercalation properties of the PLD film on silicon, as does the utilisation of stainless steel substrates.",

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AU - Bouwman, P.J.

AU - Boukamp, B. A.

AU - Bouwmeester, H. J.M.

AU - Notten, P. H.L.

PY - 2002/12/1

Y1 - 2002/12/1

N2 - Submicron films of LiCoO2 have been deposited on silicon and stainless steel substrates using RF sputtering and pulsed laser deposition (PLD). Both films show preferred orientation. RF films have their Li diffusion plane oriented favourably, that is, perpendicular to the surface, while PLD films show a parallel, c-axis orientation. Electrochemical experiments indicate a strong dependence of the intercalation rate on the alignment of the host structure toward the electrolyte solution. Lithographic patterning enhances the inferior intercalation properties of the PLD film on silicon, as does the utilisation of stainless steel substrates.

AB - Submicron films of LiCoO2 have been deposited on silicon and stainless steel substrates using RF sputtering and pulsed laser deposition (PLD). Both films show preferred orientation. RF films have their Li diffusion plane oriented favourably, that is, perpendicular to the surface, while PLD films show a parallel, c-axis orientation. Electrochemical experiments indicate a strong dependence of the intercalation rate on the alignment of the host structure toward the electrolyte solution. Lithographic patterning enhances the inferior intercalation properties of the PLD film on silicon, as does the utilisation of stainless steel substrates.

KW - Intercalation

KW - LiCoO

KW - Preferential orientation

KW - Thin film

UR - https://www.scopus.com/pages/publications/0036901450

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M3 - Article

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VL - 152-153

SP - 181

EP - 188

JO - Solid State Ionics

JF - Solid State Ionics

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