Structure-related intercalation behaviour of LiCoO2 films

P.J. Bouwman (Corresponding author), B. A. Boukamp, H. J.M. Bouwmeester, P. H.L. Notten

Research output: Contribution to journalArticleAcademicpeer-review

48 Citations (Scopus)


Submicron films of LiCoO2 have been deposited on silicon and stainless steel substrates using RF sputtering and pulsed laser deposition (PLD). Both films show preferred orientation. RF films have their Li diffusion plane oriented favourably, that is, perpendicular to the surface, while PLD films show a parallel, c-axis orientation. Electrochemical experiments indicate a strong dependence of the intercalation rate on the alignment of the host structure toward the electrolyte solution. Lithographic patterning enhances the inferior intercalation properties of the PLD film on silicon, as does the utilisation of stainless steel substrates.

Original languageEnglish
Pages (from-to)181-188
Number of pages8
JournalSolid State Ionics
Publication statusPublished - 1 Dec 2002


  • Intercalation
  • LiCoO
  • Preferential orientation
  • Thin film

Fingerprint Dive into the research topics of 'Structure-related intercalation behaviour of LiCoO<sub>2</sub> films'. Together they form a unique fingerprint.

Cite this