Strong suppression of surface recombination in InGaAs nanopillars

B.P. Romeira, A. Higuera-Rodriguez, S. Birindelli, L.E. Black, E. Smalbrugge, P.J. Van Veldhoven, W.M.M. Kessels, M.K. Smit, A. Fiore

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Abstract

Summary form only given. In this work, we report a remarkable suppression of the surface recombination rates in passivated III-V undoped InGaAs nanopillars on InP (inset of Fig. 1a). The surface passivation comprises ammonium sulfide, (NH4)2S, chemical treatment followed by encapsulation with a 50 nm layer of SiOx by plasma-enhanced chemical vapor deposition performed at 300°C. Before passivation, fabricated nanopillars with -300 nm lateral width, d, show a very poor photoluminescence (PL) emission (blue curve in Fig. 1a). The corresponding carrier dynamics, measured by time-correlated single-photon counting, Fig 1b, reveal an extremely short lifetime of ~130 ps, related to the well-known strong surface recombination velocity at InGaAs surfaces [3]. After the sulfur treatment followed by SiOx, we observe a substantial increase by almost two orders of magnitude of the PL intensity (red curve in Fig. 1a), while the carrier lifetime increases by more than two orders of magnitude to a value ~23 ns, red curve in Fig 1b. The estimated surface recombination velocity, S, decreases from about 2×104 cm/s in the untreated nanopillars down to around 260 cm/s (inset of Fig. 1b). To our knowledge, this is a record low value in undoped InGaAs semiconductors. Most importantly, our passivation studies reveal that the SiOx capping layer not only protects the pillars' sidewalls against oxidation, as reported in [5], but actively takes part in the passivation process, a result never previously reported.
Original languageEnglish
Title of host publication2017 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC), 25-29 June 2017, Munich, Germany
Place of PublicationPiscataway
PublisherInstitute of Electrical Engineers
ISBN (Electronic)978-1-5090-6736-7
ISBN (Print)978-1-5090-6737-4
DOIs
Publication statusPublished - 2017
Event2017 European Conference on Lasers and Electro-Optics and the European Quantum Electronics Conference (CLEO®/Europe-EQEC) 2017) - Messe Munich, Munich, Germany
Duration: 25 Jun 201729 Jun 2017

Conference

Conference2017 European Conference on Lasers and Electro-Optics and the European Quantum Electronics Conference (CLEO®/Europe-EQEC) 2017)
Abbreviated titleCLEO®/Europe-EQEC 2017
CountryGermany
CityMunich
Period25/06/1729/06/17

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