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Stability of indium tin oxide/polymer interfaces

  • X. Crispin
  • , A. Crispin
  • , M.P. Jong, de
  • , S. Marciniak
  • , W. Osikowicz
  • , S. Joensson
  • , M. Fahlman
  • , T. Kugler
  • , L.J. IJzendoorn, van
  • , M.J.A. Voigt, de
  • , W.R. Salaneck

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Abstract

    Interfacial chem. at In Sn oxide/polymer interfaces is of fundamental importance for the performance of polymer-based light emitting diodes. XPS and Rutherford backscattering spectrometry are used to study the stability of the interface formed between In Sn oxide and (i) the light emitting polymer poly(p-phenylenevinylene), and (ii) the hole injecting layer poly(3,4-ethylenedioxythiophene) polystyrenesulfonate. The formed interfaces are not stable and In-contg. species diffuse from the metal oxide surface into the polymer layers
    Original languageEnglish
    Title of host publicationCrystalline oxide-silicon heterostructures and oxide optoelectronics : symposium held December 2 - 4, 2002, Boston, Massachusetts, U.S.A
    EditorsD. Ginley
    Place of PublicationWarrendale, Pa.
    PublisherMaterials Research Society
    Pages315-326
    ISBN (Print)1-558-99684-2
    Publication statusPublished - 2003
    Eventconference; Symposium T: Crystalline Oxides on Semiconductors ; (Boston, Mass.) : 2002.12.02-04; 2002-12-02; 2002-12-04 -
    Duration: 2 Dec 20024 Dec 2002

    Publication series

    NameMaterials Research Society Symposium Proceedings
    Volume747
    ISSN (Print)0272-9172

    Conference

    Conferenceconference; Symposium T: Crystalline Oxides on Semiconductors ; (Boston, Mass.) : 2002.12.02-04; 2002-12-02; 2002-12-04
    Period2/12/024/12/02
    OtherSymposium T: Crystalline Oxides on Semiconductors ; (Boston, Mass.) : 2002.12.02-04

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