Soft magnetic properties of Fe/FeN multilayer films prepared by reactive diode rf sputtering

Fe/FeN multilayer films with Fe and FeN layer thicknesses in the range of respectively 80-110 and 30-80 Å have been prepared using a reactive diode rf sputtering system. Their crystallographic characteristics and magnetic properties have been investigated to determine the deposition conditions leading to good soft magnetic properties. Results show that the application of a static magnetic field during the deposition improves the soft magnetic propertoes of the films, by varying the mean iron grain orientation. Coercivity smaller than 40 A/m, saturation magnetization up to 1.9 T and permeability up to 1600 were obtained for a nitrogen partial pressure equal to 2 mTorr and the FeN layer thickness less than 50 Å.