Size control of gas phase grown silicon nanocrystals by varying the plasma OFF time in silane pulsed plasma

A. Mohan; I. Poulios; R.E.I. Schropp; J.K. Rath

doi:10.1557/opl.2015.476

Size control of gas phase grown silicon nanocrystals by varying the plasma OFF time in silane pulsed plasma

A. Mohan
, I. Poulios
, R.E.I. Schropp
, J.K. Rath

Plasma & Materials Processing

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

3 Citations (Scopus)

Abstract

Silicon nanoparticles are synthesized by very high frequency Plasma Enhanced Chemical Vapor Deposition (vhf-PECVD) in the gas phase. Pulsed plasmas are used to obtain particles with a narrow size distribution. The role of plasma OFF times is studied to tailor the size of the silicon nanoparticles. Various plasma OFF times are chosen, both longer- and shorter -than the residence time of the gases in the discharge. Time resolved optical emission spectroscopy (TROES) studies provide additional information about the growth precursor dynamics during plasma modulation. The size and the size distribution studies of the particles are done with transmission electron microscopy (TEM). These studies reveal that a plasma OFF time longer than the residence time is favorable for the formation of quantum sized silicon particles.

Original language	English
Title of host publication	Material Research Society (MRS) Proceedings
Editors	B. Hekmatshoar, D. Horwat, M. Sankaran
Publisher	Materials Research Society
DOIs	https://doi.org/10.1557/opl.2015.476
Publication status	Published - 2015
Event	2015 MRS Spring Meeting & Exhibit - San Francisco, United States Duration: 6 Apr 2015 → 9 Apr 2015 https://www.mrs.org/spring-2015

Publication series

Name	Materials Research Society Symposium Proceedings
Volume	1803
ISSN (Print)	0272-9172

Conference

Conference	2015 MRS Spring Meeting & Exhibit
Country/Territory	United States
City	San Francisco
Period	6/04/15 → 9/04/15
Internet address	https://www.mrs.org/spring-2015

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10.1557/opl.2015.476

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Mohan, A., Poulios, I., Schropp, R. E. I., & Rath, J. K. (2015). Size control of gas phase grown silicon nanocrystals by varying the plasma OFF time in silane pulsed plasma. In B. Hekmatshoar, D. Horwat, & M. Sankaran (Eds.), Material Research Society (MRS) Proceedings (Materials Research Society Symposium Proceedings; Vol. 1803). Materials Research Society. https://doi.org/10.1557/opl.2015.476

@inproceedings{596aab2667fe40ffac8e655c57142d5c,

title = "Size control of gas phase grown silicon nanocrystals by varying the plasma OFF time in silane pulsed plasma",

abstract = "Silicon nanoparticles are synthesized by very high frequency Plasma Enhanced Chemical Vapor Deposition (vhf-PECVD) in the gas phase. Pulsed plasmas are used to obtain particles with a narrow size distribution. The role of plasma OFF times is studied to tailor the size of the silicon nanoparticles. Various plasma OFF times are chosen, both longer- and shorter -than the residence time of the gases in the discharge. Time resolved optical emission spectroscopy (TROES) studies provide additional information about the growth precursor dynamics during plasma modulation. The size and the size distribution studies of the particles are done with transmission electron microscopy (TEM). These studies reveal that a plasma OFF time longer than the residence time is favorable for the formation of quantum sized silicon particles.",

author = "A. Mohan and I. Poulios and R.E.I. Schropp and J.K. Rath",

year = "2015",

doi = "10.1557/opl.2015.476",

language = "English",

series = "Materials Research Society Symposium Proceedings",

publisher = "Materials Research Society",

editor = "B. Hekmatshoar and D. Horwat and M. Sankaran",

booktitle = "Material Research Society (MRS) Proceedings",

address = "United States",

note = "2015 MRS Spring Meeting \& Exhibit ; Conference date: 06-04-2015 Through 09-04-2015",

url = "https://www.mrs.org/spring-2015",

}

Mohan, A, Poulios, I, Schropp, REI & Rath, JK 2015, Size control of gas phase grown silicon nanocrystals by varying the plasma OFF time in silane pulsed plasma. in B Hekmatshoar, D Horwat & M Sankaran (eds), Material Research Society (MRS) Proceedings. Materials Research Society Symposium Proceedings, vol. 1803, Materials Research Society, 2015 MRS Spring Meeting & Exhibit, San Francisco, California, United States, 6/04/15. https://doi.org/10.1557/opl.2015.476

Size control of gas phase grown silicon nanocrystals by varying the plasma OFF time in silane pulsed plasma. / Mohan, A.; Poulios, I.; Schropp, R.E.I. et al.
Material Research Society (MRS) Proceedings. ed. / B. Hekmatshoar; D. Horwat; M. Sankaran. Materials Research Society, 2015. (Materials Research Society Symposium Proceedings; Vol. 1803).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Size control of gas phase grown silicon nanocrystals by varying the plasma OFF time in silane pulsed plasma

AU - Mohan, A.

AU - Poulios, I.

AU - Schropp, R.E.I.

AU - Rath, J.K.

PY - 2015

Y1 - 2015

N2 - Silicon nanoparticles are synthesized by very high frequency Plasma Enhanced Chemical Vapor Deposition (vhf-PECVD) in the gas phase. Pulsed plasmas are used to obtain particles with a narrow size distribution. The role of plasma OFF times is studied to tailor the size of the silicon nanoparticles. Various plasma OFF times are chosen, both longer- and shorter -than the residence time of the gases in the discharge. Time resolved optical emission spectroscopy (TROES) studies provide additional information about the growth precursor dynamics during plasma modulation. The size and the size distribution studies of the particles are done with transmission electron microscopy (TEM). These studies reveal that a plasma OFF time longer than the residence time is favorable for the formation of quantum sized silicon particles.

AB - Silicon nanoparticles are synthesized by very high frequency Plasma Enhanced Chemical Vapor Deposition (vhf-PECVD) in the gas phase. Pulsed plasmas are used to obtain particles with a narrow size distribution. The role of plasma OFF times is studied to tailor the size of the silicon nanoparticles. Various plasma OFF times are chosen, both longer- and shorter -than the residence time of the gases in the discharge. Time resolved optical emission spectroscopy (TROES) studies provide additional information about the growth precursor dynamics during plasma modulation. The size and the size distribution studies of the particles are done with transmission electron microscopy (TEM). These studies reveal that a plasma OFF time longer than the residence time is favorable for the formation of quantum sized silicon particles.

U2 - 10.1557/opl.2015.476

DO - 10.1557/opl.2015.476

M3 - Conference contribution

T3 - Materials Research Society Symposium Proceedings

BT - Material Research Society (MRS) Proceedings

A2 - Hekmatshoar, B.

A2 - Horwat, D.

A2 - Sankaran, M.

PB - Materials Research Society

T2 - 2015 MRS Spring Meeting & Exhibit

Y2 - 6 April 2015 through 9 April 2015

ER -

Size control of gas phase grown silicon nanocrystals by varying the plasma OFF time in silane pulsed plasma

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