Size control of gas phase grown silicon nanocrystals by varying the plasma OFF time in silane pulsed plasma

A. Mohan, I. Poulios, R.E.I. Schropp, J.K. Rath

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

2 Citations (Scopus)

Abstract

Silicon nanoparticles are synthesized by very high frequency Plasma Enhanced Chemical Vapor Deposition (vhf-PECVD) in the gas phase. Pulsed plasmas are used to obtain particles with a narrow size distribution. The role of plasma OFF times is studied to tailor the size of the silicon nanoparticles. Various plasma OFF times are chosen, both longer- and shorter -than the residence time of the gases in the discharge. Time resolved optical emission spectroscopy (TROES) studies provide additional information about the growth precursor dynamics during plasma modulation. The size and the size distribution studies of the particles are done with transmission electron microscopy (TEM). These studies reveal that a plasma OFF time longer than the residence time is favorable for the formation of quantum sized silicon particles.
Original languageEnglish
Title of host publicationMaterial Research Society (MRS) Proceedings
EditorsB. Hekmatshoar, D. Horwat, M. Sankaran
PublisherMaterials Research Society
DOIs
Publication statusPublished - 2015
EventPlasma-Based Materials Science and Engineering, April 7-9, 2015, San Francisco, CA, USA - San Francisco, CA, United States
Duration: 7 Apr 20159 Apr 2015
http://www.mrs.org/spring-2015-program-qq/

Publication series

NameMaterials Research Society Symposium Proceedings
Volume1803
ISSN (Print)0272-9172

Conference

ConferencePlasma-Based Materials Science and Engineering, April 7-9, 2015, San Francisco, CA, USA
CountryUnited States
CitySan Francisco, CA
Period7/04/159/04/15
OtherSymposium held at the 2015 MRS Spring Meeting
Internet address

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