Si/XeF2-etching: Reaction layer dynamics and surface roughening

M.J.M. Vugts, M.F.A. Eurlings, L.J.F. Hermans, H.C.W. Beijerinck

Research output: Contribution to journalArticleAcademicpeer-review

34 Citations (Scopus)
Original languageEnglish
Pages (from-to)2780-2789
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films
Volume14
Issue number5
DOIs
Publication statusPublished - 1996

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