Simple technologies for fabrication of low-loss silica waveguides

Q. Lai, J.S. Gu, M.K. Smit, J. Schmid, H. Melchior

Research output: Contribution to journalArticlePopular

22 Citations (Scopus)
101 Downloads (Pure)

Abstract

A simple and reproducible technology is developed for the fabrication of low-loss silica waveguides on silicon substrates. The guiding layer is formed by changing the Si-O ratio composition of the SiO/sub 2/ layer. The waveguides can be made to have a good match to either optical fibres or guided-wave devices in III-V compound semiconductors
Original languageEnglish
Pages (from-to)1000-1001
JournalElectronics Letters
Volume28
Issue number11
Publication statusPublished - 1992

Fingerprint

Dive into the research topics of 'Simple technologies for fabrication of low-loss silica waveguides'. Together they form a unique fingerprint.

Cite this