Silicon oxide particle formation in RF plasmas investigated by infrared absorption spectroscopy and mass spectrometry
- Ch. Hollenstein
- , A.A. Howling
- , C. Courteille
- , D. Magni
- , S.M. Scholz
- , G.M.W. Kroesen
- , N. Simons
- , W. de Zeeuw
- , W. Schwarzenbach
Research output: Contribution to journal › Article › Academic › peer-review
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