Silicon nitride antireflection coatings with excellent surface and bulk passivation properties deposited at high rates by the expanding thermal plasmas

M.C.M. Sanden, van de; B. Hoex; P.J. Oever, van den; A.J.M. van Erven; M.D. Bijker; W.M.M. Kessels

Silicon nitride antireflection coatings with excellent surface and bulk passivation properties deposited at high rates by the expanding thermal plasmas

M.C.M. Sanden, van de
, B. Hoex
, P.J. Oever, van den
, A.J.M. van Erven
, M.D. Bijker
, W.M.M. Kessels

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

2 Downloads (Pure)

Original language	English
Title of host publication	ICRP-6/SPP-23 : proceedings of the 6th international conference on reactive plasmas and 23rd symposium on plasma processing : January 24-27, 2006, Matsushima/Sendai, Japan
Editors	R. Hatakeyama, S. Samukawa
Pages	431-432
Publication status	Published - 2006

Cite this

Sanden, van de, M. C. M., Hoex, B., Oever, van den, P. J., van Erven, A. J. M., Bijker, M. D., & Kessels, W. M. M. (2006). Silicon nitride antireflection coatings with excellent surface and bulk passivation properties deposited at high rates by the expanding thermal plasmas. In R. Hatakeyama, & S. Samukawa (Eds.), ICRP-6/SPP-23 : proceedings of the 6th international conference on reactive plasmas and 23rd symposium on plasma processing : January 24-27, 2006, Matsushima/Sendai, Japan (pp. 431-432)

Sanden, van de, M.C.M. ; Hoex, B. ; Oever, van den, P.J. et al. / Silicon nitride antireflection coatings with excellent surface and bulk passivation properties deposited at high rates by the expanding thermal plasmas. ICRP-6/SPP-23 : proceedings of the 6th international conference on reactive plasmas and 23rd symposium on plasma processing : January 24-27, 2006, Matsushima/Sendai, Japan. editor / R. Hatakeyama ; S. Samukawa. 2006. pp. 431-432

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title = "Silicon nitride antireflection coatings with excellent surface and bulk passivation properties deposited at high rates by the expanding thermal plasmas",

author = "\{Sanden, van de\}, M.C.M. and B. Hoex and \{Oever, van den\}, P.J. and \{van Erven\}, A.J.M. and M.D. Bijker and W.M.M. Kessels",

year = "2006",

language = "English",

pages = "431--432",

editor = "R. Hatakeyama and S. Samukawa",

booktitle = "ICRP-6/SPP-23 : proceedings of the 6th international conference on reactive plasmas and 23rd symposium on plasma processing : January 24-27, 2006, Matsushima/Sendai, Japan",

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Sanden, van de, MCM, Hoex, B, Oever, van den, PJ, van Erven, AJM, Bijker, MD & Kessels, WMM 2006, Silicon nitride antireflection coatings with excellent surface and bulk passivation properties deposited at high rates by the expanding thermal plasmas. in R Hatakeyama & S Samukawa (eds), ICRP-6/SPP-23 : proceedings of the 6th international conference on reactive plasmas and 23rd symposium on plasma processing : January 24-27, 2006, Matsushima/Sendai, Japan. pp. 431-432.

Silicon nitride antireflection coatings with excellent surface and bulk passivation properties deposited at high rates by the expanding thermal plasmas. / Sanden, van de, M.C.M.; Hoex, B.; Oever, van den, P.J. et al.
ICRP-6/SPP-23 : proceedings of the 6th international conference on reactive plasmas and 23rd symposium on plasma processing : January 24-27, 2006, Matsushima/Sendai, Japan. ed. / R. Hatakeyama; S. Samukawa. 2006. p. 431-432.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

TY - GEN

T1 - Silicon nitride antireflection coatings with excellent surface and bulk passivation properties deposited at high rates by the expanding thermal plasmas

AU - Sanden, van de, M.C.M.

AU - Hoex, B.

AU - Oever, van den, P.J.

AU - van Erven, A.J.M.

AU - Bijker, M.D.

AU - Kessels, W.M.M.

PY - 2006

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M3 - Conference contribution

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EP - 432

BT - ICRP-6/SPP-23 : proceedings of the 6th international conference on reactive plasmas and 23rd symposium on plasma processing : January 24-27, 2006, Matsushima/Sendai, Japan

A2 - Hatakeyama, R.

A2 - Samukawa, S.

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Sanden, van de MCM, Hoex B, Oever, van den PJ, van Erven AJM, Bijker MD, Kessels WMM. Silicon nitride antireflection coatings with excellent surface and bulk passivation properties deposited at high rates by the expanding thermal plasmas. In Hatakeyama R, Samukawa S, editors, ICRP-6/SPP-23 : proceedings of the 6th international conference on reactive plasmas and 23rd symposium on plasma processing : January 24-27, 2006, Matsushima/Sendai, Japan. 2006. p. 431-432