Silicon etching in hydrogen bromide reactive ion etching plasmas

T.D. Bestwick, G.S. Oehrlein, G.M.W. Kroesen, F. Cardone, G.J. Scilla

Research output: Contribution to journalArticleAcademicpeer-review

Original languageEnglish
Pages (from-to)285-292
JournalProceedings - Electrochemical Society
Volume90-14
Issue numberProc. Symp
Publication statusPublished - 1990

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