Semiconductor apparatus and method of fabrication for a semiconductor apparatus

P. Engelhart; R. Seguin; W.M.M. Kessels; G. Dingemans

Semiconductor apparatus and method of fabrication for a semiconductor apparatus

P. Engelhart (Inventor)
, R. Seguin (Inventor)
, W.M.M. Kessels (Inventor)
, G. Dingemans (Inventor)

Research output: Patent › Patent publication

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Abstract

The invention relates to a semiconductor apparatus (1) and a method of fabrication for a semiconductor apparatus (1), wherein the semiconductor apparatus (1) comprises a semiconductor layer (2) and a passivation layer (3), arranged on a surface of the semiconductor layer (2), for passivating the semiconductor layer surface (20), wherein the passivation layer (3) comprises a chemically passivating passivation layer element (31) and a field-effect-passivating passivation layer (33) which are arranged above one another on the semiconductor layer surface (20). The semiconductor apparatus is preferably a solar cell.

Original language	English
Patent number	WO2010145648
Publication status	Published - 23 Dec 2010

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title = "Semiconductor apparatus and method of fabrication for a semiconductor apparatus",

abstract = "The invention relates to a semiconductor apparatus (1) and a method of fabrication for a semiconductor apparatus (1), wherein the semiconductor apparatus (1) comprises a semiconductor layer (2) and a passivation layer (3), arranged on a surface of the semiconductor layer (2), for passivating the semiconductor layer surface (20), wherein the passivation layer (3) comprises a chemically passivating passivation layer element (31) and a field-effect-passivating passivation layer (33) which are arranged above one another on the semiconductor layer surface (20). The semiconductor apparatus is preferably a solar cell.",

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T1 - Semiconductor apparatus and method of fabrication for a semiconductor apparatus

AU - Engelhart, P.

AU - Seguin, R.

AU - Kessels, W.M.M.

AU - Dingemans, G.

PY - 2010/12/23

Y1 - 2010/12/23

N2 - The invention relates to a semiconductor apparatus (1) and a method of fabrication for a semiconductor apparatus (1), wherein the semiconductor apparatus (1) comprises a semiconductor layer (2) and a passivation layer (3), arranged on a surface of the semiconductor layer (2), for passivating the semiconductor layer surface (20), wherein the passivation layer (3) comprises a chemically passivating passivation layer element (31) and a field-effect-passivating passivation layer (33) which are arranged above one another on the semiconductor layer surface (20). The semiconductor apparatus is preferably a solar cell.

AB - The invention relates to a semiconductor apparatus (1) and a method of fabrication for a semiconductor apparatus (1), wherein the semiconductor apparatus (1) comprises a semiconductor layer (2) and a passivation layer (3), arranged on a surface of the semiconductor layer (2), for passivating the semiconductor layer surface (20), wherein the passivation layer (3) comprises a chemically passivating passivation layer element (31) and a field-effect-passivating passivation layer (33) which are arranged above one another on the semiconductor layer surface (20). The semiconductor apparatus is preferably a solar cell.

UR - http://v3.espacenet.com/publicationDetails/biblio?CC=WO&NR=2010145648A1&KC=A1&FT=D&date=20101223&DB=&locale=nl_NL

M3 - Patent publication

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Semiconductor apparatus and method of fabrication for a semiconductor apparatus

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