Self-replenishing low surface-energy polyurethane films

T. Dikic, W. Ming, P.C. Thüne, M. Tian, R.A.T.M. Benthem, van, G. With, de

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

Abstract

Surface segregation is a concept frequently used for obtaining films with desired surface functionality, such as surfaces enriched in low surface-energy species. Low surface-energy films with fluorine-rich surfaces have many desirable properties such as water/oil repellency and low friction coeff., and have been developed via surface segregation of fluorinated species during film formation. However, it has been shown that the fluorine-enriched layer is generally very thin (<20 nm), and the coating may not sustain the low surface-energy character upon mech. abrasion. We have developed a self-replenishing strategy to sustain the low surface-energy character of partially fluorinated polyurethane films: in case of surface damage that leads to the loss of the top layers of the coating, fluorinated tails from sub-layers can reorient themselves to minimize the air/film interfacial energy of the newly created surface. The network mobility and a proper spacer between the fluorinated tail and the cross-linked network have proven to be the key elements in realizing the self-replenishing behavior. [on SciFinder (R)]
Original languageEnglish
Title of host publicationAbstracts of Papers, 235th ACS National Meeting, New Orleans, LA, United States
Place of PublicationWashington, D. C
PublisherAmerican Chemical Society
PagesPOLY-612
Publication statusPublished - 2008
Event235th ACS National Meeting - New Orleans, United States
Duration: 6 Apr 200810 Apr 2008

Conference

Conference235th ACS National Meeting
CountryUnited States
CityNew Orleans
Period6/04/0810/04/08

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Dikic, T., Ming, W., Thüne, P. C., Tian, M., Benthem, van, R. A. T. M., & With, de, G. (2008). Self-replenishing low surface-energy polyurethane films. In Abstracts of Papers, 235th ACS National Meeting, New Orleans, LA, United States (pp. POLY-612). Washington, D. C: American Chemical Society.