Second harmonic generation in fundamental plasma-processing studies: Si etching

A.A.E. Stevens; J.J.H. Gielis; P.M. Gevers; H.C.W. Beijerinck; W.M.M. Kessels

Second harmonic generation in fundamental plasma-processing studies: Si etching

A.A.E. Stevens
, J.J.H. Gielis
, P.M. Gevers
, H.C.W. Beijerinck
, W.M.M. Kessels

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

Original language	English
Title of host publication	Wetenschappelijke FOM-dagen Gecondenseerde Materie; Veldhoven, The Netherlands, 14-15 December, 2004
Place of Publication	Veldhoven, The Netherlands
Publication status	Published - 2004
Event	conference; Wetenschappelijke FOM-dagen Gecondenseerde Materie; 2004-12-14; 2004-12-15 - Duration: 14 Dec 2004 → 15 Dec 2004

Conference

Conference	conference; Wetenschappelijke FOM-dagen Gecondenseerde Materie; 2004-12-14; 2004-12-15
Period	14/12/04 → 15/12/04
Other	Wetenschappelijke FOM-dagen Gecondenseerde Materie

Cite this

@inproceedings{51a85c00358a43cd849ee047977933bc,

title = "Second harmonic generation in fundamental plasma-processing studies: Si etching",

author = "A.A.E. Stevens and J.J.H. Gielis and P.M. Gevers and H.C.W. Beijerinck and W.M.M. Kessels",

year = "2004",

language = "English",

booktitle = "Wetenschappelijke FOM-dagen Gecondenseerde Materie; Veldhoven, The Netherlands, 14-15 December, 2004",

note = "conference; Wetenschappelijke FOM-dagen Gecondenseerde Materie; 2004-12-14; 2004-12-15 ; Conference date: 14-12-2004 Through 15-12-2004",

}

Stevens, AAE, Gielis, JJH, Gevers, PM, Beijerinck, HCW & Kessels, WMM 2004, Second harmonic generation in fundamental plasma-processing studies: Si etching. in Wetenschappelijke FOM-dagen Gecondenseerde Materie; Veldhoven, The Netherlands, 14-15 December, 2004. Veldhoven, The Netherlands, conference; Wetenschappelijke FOM-dagen Gecondenseerde Materie; 2004-12-14; 2004-12-15, 14/12/04.

Second harmonic generation in fundamental plasma-processing studies: Si etching. / Stevens, A.A.E.; Gielis, J.J.H.; Gevers, P.M. et al.
Wetenschappelijke FOM-dagen Gecondenseerde Materie; Veldhoven, The Netherlands, 14-15 December, 2004. Veldhoven, The Netherlands, 2004.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

TY - GEN

T1 - Second harmonic generation in fundamental plasma-processing studies: Si etching

AU - Stevens, A.A.E.

AU - Gielis, J.J.H.

AU - Gevers, P.M.

AU - Beijerinck, H.C.W.

AU - Kessels, W.M.M.

PY - 2004

Y1 - 2004

M3 - Conference contribution

BT - Wetenschappelijke FOM-dagen Gecondenseerde Materie; Veldhoven, The Netherlands, 14-15 December, 2004

CY - Veldhoven, The Netherlands

T2 - conference; Wetenschappelijke FOM-dagen Gecondenseerde Materie; 2004-12-14; 2004-12-15

Y2 - 14 December 2004 through 15 December 2004

ER -