@inproceedings{51a85c00358a43cd849ee047977933bc,
title = "Second harmonic generation in fundamental plasma-processing studies: Si etching",
author = "A.A.E. Stevens and J.J.H. Gielis and P.M. Gevers and H.C.W. Beijerinck and W.M.M. Kessels",
year = "2004",
language = "English",
booktitle = "Wetenschappelijke FOM-dagen Gecondenseerde Materie; Veldhoven, The Netherlands, 14-15 December, 2004",
note = "conference; Wetenschappelijke FOM-dagen Gecondenseerde Materie; 2004-12-14; 2004-12-15 ; Conference date: 14-12-2004 Through 15-12-2004",
}