Scheduling a Real-World Photolithography Area with Constraint Programming

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Abstract

This paper studies the problem of scheduling machines in the photolithography area of a semiconductor manufacturing facility. The scheduling problem is characterized as an unrelated parallel machine scheduling problem with machine eligibilities, sequence- and machine-dependent setup times, auxiliary resources and transfer times for the auxiliary resources. Each job requires two auxiliary resources: a reticle and a pod. Reticles are handled in pods and a pod contains multiple reticles. Both reticles and pods are used on multiple machines and a transfer time is required if transferred from one machine to another. A novel constraint programming (CP) approach is proposed and is benchmarked against a mixed-integer programming (MIP) method. The results of the study, consisting of a real-world case study at a global semiconductor manufacturer, demonstrate that the CP approach significantly outperforms the MIP method and produces high-quality solutions for multiple real-world instances, although optimality cannot be guaranteed.
Original languageEnglish
Article number10214506
Pages (from-to)590-598
Number of pages9
JournalIEEE Transactions on Semiconductor Manufacturing
Volume36
Issue number4
DOIs
Publication statusPublished - Nov 2023

Keywords

  • Constraint handling
  • Job shop scheduling
  • Lithography
  • Optimization
  • Parallel machines
  • Production
  • Semiconductor manufacturing
  • Throughput
  • constraint programming
  • integer linear programming
  • photolithography
  • production scheduling
  • real-world case study

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