Abstract
The resist image quality produced by step-and-scan exposure tools depends upon the performance of the synchronized wafer and reticle stages as much as on the quality of the optics. Achieving high throughput and sub-quarter micron resolution requires careful stage engineering.
Original language | English |
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Pages (from-to) | 8-16 |
Journal | Microlithography World |
Volume | 8 |
Issue number | 2 |
Publication status | Published - 1999 |