Scanning stage technology for exposure tools

H. Butler; R.A. George; J.J.A. Baselmans

Scanning stage technology for exposure tools

H. Butler, R.A. George, J.J.A. Baselmans

Control Systems

Research output: Contribution to journal › Article › Academic › peer-review

5 Citations (Scopus)

9 Downloads (Pure)

Abstract

The resist image quality produced by step-and-scan exposure tools depends upon the performance of the synchronized wafer and reticle stages as much as on the quality of the optics. Achieving high throughput and sub-quarter micron resolution requires careful stage engineering.

Original language	English
Pages (from-to)	8-16
Journal	Microlithography World
Volume	8
Issue number	2
Publication status	Published - 1999

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@article{33624db4d7e749a38404bd774a81f31a,

title = "Scanning stage technology for exposure tools",

abstract = "The resist image quality produced by step-and-scan exposure tools depends upon the performance of the synchronized wafer and reticle stages as much as on the quality of the optics. Achieving high throughput and sub-quarter micron resolution requires careful stage engineering.",

author = "H. Butler and R.A. George and J.J.A. Baselmans",

year = "1999",

language = "English",

volume = "8",

pages = "8--16",

journal = "Microlithography World",

issn = "1074-407X",

publisher = "PennWell Corp.",

number = "2",

}

TY - JOUR

T1 - Scanning stage technology for exposure tools

AU - Butler, H.

AU - George, R.A.

AU - Baselmans, J.J.A.

PY - 1999

Y1 - 1999

N2 - The resist image quality produced by step-and-scan exposure tools depends upon the performance of the synchronized wafer and reticle stages as much as on the quality of the optics. Achieving high throughput and sub-quarter micron resolution requires careful stage engineering.

AB - The resist image quality produced by step-and-scan exposure tools depends upon the performance of the synchronized wafer and reticle stages as much as on the quality of the optics. Achieving high throughput and sub-quarter micron resolution requires careful stage engineering.

M3 - Article

VL - 8

SP - 8

EP - 16

JO - Microlithography World

JF - Microlithography World

SN - 1074-407X

IS - 2

ER -