Scanning stage technology for exposure tools

H. Butler, R.A. George, J.J.A. Baselmans

Research output: Contribution to journalArticleAcademicpeer-review

5 Citations (Scopus)
9 Downloads (Pure)

Abstract

The resist image quality produced by step-and-scan exposure tools depends upon the performance of the synchronized wafer and reticle stages as much as on the quality of the optics. Achieving high throughput and sub-quarter micron resolution requires careful stage engineering.
Original languageEnglish
Pages (from-to)8-16
JournalMicrolithography World
Volume8
Issue number2
Publication statusPublished - 1999

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