Scanning stage technology for exposure tools

H. Butler, R.A. George, J.J.A. Baselmans

Research output: Contribution to journalArticleAcademicpeer-review

7 Citations (Scopus)
11 Downloads (Pure)


The resist image quality produced by step-and-scan exposure tools depends upon the performance of the synchronized wafer and reticle stages as much as on the quality of the optics. Achieving high throughput and sub-quarter micron resolution requires careful stage engineering.
Original languageEnglish
Pages (from-to)8-16
JournalMicrolithography World
Issue number2
Publication statusPublished - 1999


Dive into the research topics of 'Scanning stage technology for exposure tools'. Together they form a unique fingerprint.

Cite this