The influence of the line scan density on the resulting profile of an exposed resist pattern is described for a pattern written by a laser beam pattern generator (LBPG). It is shown that employing a wide band optical modulator in conjunction with appropriate oversampling is beneficial for the modulation depth and the steepness of critical features in the pattern. The relationship between the modulation depth and the rate of oversampling is given.
|Journal||Pure and Applied Optics: Journal of the European Optical Society Part A|
|Publication status||Published - 1994|