Scan density and resolution in a laser beam pattern generator

G. Boer, de, J.J.M. Braat, A.J.E.M. Janssen

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    Abstract

    The influence of the line scan density on the resulting profile of an exposed resist pattern is described for a pattern written by a laser beam pattern generator (LBPG). It is shown that employing a wide band optical modulator in conjunction with appropriate oversampling is beneficial for the modulation depth and the steepness of critical features in the pattern. The relationship between the modulation depth and the rate of oversampling is given.
    Original languageEnglish
    Pages (from-to)623-641
    JournalPure and Applied Optics: Journal of the European Optical Society Part A
    Volume3
    Issue number4
    DOIs
    Publication statusPublished - 1994

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